Used LAM RESEARCH Sabre XT #9223294 for sale
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ID: 9223294
Wafer Size: 8"
Vintage: 2007
Electro copper plating system, 8"
Wafer cassette: 25 Wafer
Mini-environment: SYNETICS
Chase computer/monitor: Desktop PC/CRT
Exhaust kit: Top mount
Drain kit: Backside
Cassette handler module:
Load port: Static nests, (4) stations
Wafer aligner type: Mechanical center finder
Robot type: AQR7 BROOKS
End effector: SST x/Vacuum port
Mapping type: Thru-beam
Wafer release: With puff
Plating cell configuration:
Cell 1 / Cell 2 / Cell 3:
Clamshell type: Standard
Clamshell cup type: PPS
Clamshell cylinder: Pressure vacuum cylinder
ANODE Type: Standard
(2) TI Cables
SAC
Clamshell lift: IAI
ACR
Active top hat
Plating power: AE Pulse power supply
Post plating cell configuration:
Cell 1 / Cell 2 / Cell 3:
Chuck type: PPS
Wafer present sensor mount: Standard
EBR
Bath Module
Totalizer #1 / #2: FLORITE
Dosing pump 1 / 2 / 3: MS1602-024
Recirculation pump mpdel: IWAKI WALCHEM CMD-101
CDM Level sensor type: KEYANCE
Heat exchanger: NESLAB HX-75
Auxiliary equipment:
Chemical monitoring system (CMS): ECI QLC-7000
Chemical delivery system (CDS)
Mini delivery system (MDS)
DI Water delivery system
Input voltage: 208 VAC, 50/60 Hz, 100 A
2007 vintage.
LAM RESEARCH Sabre XT is a low-pressure, multi-chamber, atmospheric plasma equipment that is designed to optimize etch and deposition processes in the semiconductor industry. It is the second generation of the Sabre family of products and is a result of extensive research by LAM RESEARCH engineers. Sabre XT features advanced technology for improved performance and process control. It is equipped with a magnetically-coupled, multi-stage system which reduces deposition chamber bleed, providing better control over etch selectivity and profile features. The reactor also features a low-pressure, four-zone, fired-heaters process that is designed to ensure uniform deposition rates inside the etch chamber in order to achieve optimum results. In addition, LAM RESEARCH Sabre XT also contains a distributed, power-relay unit and Process Monitoring and Control (PMC) software package for uniform process control and optimization. Sabre XT also boasts a 'programmable' chamber for process automation and customization. This allows for precise control over the etch and deposit process parameters, further improving throughput and etch yields. LAM RESEARCH Sabre XT has a particle masker and filter machine which can help to reduce the effects of particle build-up, ensuring a cleaner, more uniform reaction surface. Sabre XT is a versatile tool that has been designed to assist in the production of a wide variety of semiconductor products, including DRAMs, flash memory, microcontrollers, programmable logic, CPUs, memory ICs, and SoCs. It is an industry-standard asset for many production lines and is capable of performing high-end processes such as etch depth adjustment and lithography. The reactor is highly reliable, with a mean time between failures of 20,000 hours. LAM RESEARCH Sabre XT is a robust, reliable reactor model that is perfect for any semiconductor production line. With its advanced technology, programmable chamber and superior particle masker and filter equipment, Sabre XT is the perfect solution for achieving the highest quality in etch and deposition processes.
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