Used LAM RESEARCH Sabre #9167356 for sale

LAM RESEARCH SABRE is a type of plasma etch reactor designed to deliver advanced plasma etch solutions. The system is one of the first in the industry to provide both low-pressure and high-pressure plasma processes in the same machine, enabling customers to save both time and money. The high-pressure etch process is ideal for applications such as contact and metal etching and the low-pressure process is ideal for etching of dielectric materials. The reactor is a finished dry etcher, meaning that it can provide low and high pressure etch processes without the need for any additional gas distribution systems (GDS). SABRE offers excellent uniformity across all levels of the wafer, ensuring higher yields and the highest quality parts. It also has the corner quartet technology which provides higher product quality over larger geometries with minimal process steps. LAM RESEARCH SABRE also offers features such as fast etch rates, excellent process control and repeatability, built-in process database support, and the ability to be calibrated for different recipes in just a few minutes. The reactor also offers complete integration with Fab-level automation systems such as iMap, which makes the system a perfect choice for automated fabs. The built-in software as well as the single-wafer loading (SWL) feature of SABRE allows for high throughput and flexibility with easier setup and operation. The SWL feature lets users select the appropriate etch chamber temperature, target pressure, pre-fill gas flow rate, and the process recipe. This saves users valuable time and eliminates manual work. LAM RESEARCH SABRE is designed to improve process reliability, stability, and productivity. It offers quick tool start-up times and robust recipes that allow users to increase productivity and reduce costs. The integrated process database, automated recipe development, and corner quartet technology make the system easy to use, reliable, and flexible. It is an excellent choice for any plasma etching needs.