Used LAM RESEARCH Sabre #9200240 for sale

LAM RESEARCH Sabre is a high-performance plasma etch equipment created by LAM RESEARCH for the purpose of semiconductor applications. This system leverages a unique multi-mode process chamber to deliver greater etch flexibility and allow customers to achieve superior depth of etch and high selectivity for their process. Sabre process chamber uses an advanced hollow cathode design that is optimized for etching. It is designed to deliver high etch rates, uniform etch profiles, and excellent selectivity. The unit comes with a robust RF generator, enabling users to quickly set up and adjust the parameters for their desired etch profile. The machine can be tuned to provide the optimum performance for various etch recipes. Users can also choose from a variety of chamber configurations, depending on their needs. The tool can be configured with either a single or dual gas shower header, allowing customers to choose the best option for their particular application. LAM RESEARCH Sabre process chamber also utilizes LAM RESEARCH SureGrip™ technology, which enables precise etch control and repeatability. The chamber also incorporates an active plasma collimator, allowing for improved etch uniformity and process repeatability. In addition, Sabre asset includes process control software to help users rapidly achieve their performance targets. LAM RESEARCH Sabre model can be used for variety of etching processes including deep and shallow etching for high-aspect ratio features. It is ideal for micromachining ultra-small features, and can be used for dry etching or Photoresist etching. The equipment also features a low gas flow capability, enabling users to etch with minimum gas consumption. Overall, Sabre reactor from LAM RESEARCH is a highly capable etch system, offering excellent etching performance and reliability. Its wide range of configurability and features make it a great choice for a number of semiconductor processes, providing users with an effective solution for their needs.