Used LAM RESEARCH STRATA-GX #293626279 for sale

Manufacturer
LAM RESEARCH
Model
STRATA-GX
ID: 293626279
Wafer Size: 12"
Vintage: 2016
CVD System, 12" 2016 vintage.
LAM RESEARCH STRATA-GX is a high-performance inductively-coupled, plasma-based reactor designed to provide advanced etch processing capabilities for a wide variety of substrates. The reactor combination of chamber construction and components enables repeatable, high-density plasma (HDP) processing at an enhanced process rate. STRATA-GX reactor provides geometrically uniform, high-speed etching with low substrate distortion for a variety of applications including MEMS, deep-silicon, biomedical, and flat-panel display applications. The reactor combines a multi-point susceptor, three-zone linear inductively coupled plasma (LICP) source and uniform power delivery system, which allow for the generation of repeatable results in a variety of process flows and multiple etch rates. LAM RESEARCH STRATA-GX is designed to further reduce plasma damage and optimize etching processes by providing exceptional uniformity over a wide process window. STRATA-GX reactor's design allows for a wide range of process parameters, including plasma density control, custom pressure profiles, timing of multiple plasmas, multi-point uniformity, and power control. This flexibility allows the user to optimize etching performances and benefit from advanced process control. LAM RESEARCH STRATA-GX is optimized for plasma chemistry interactions that help reduce particle formation and etch damage. The reactor has an optimized pulse-width modulation (PWM) control feature that enables control of both the reactants and the product gases. The PWM feature further controls the mobility of the reactants and allows for greater uniformity and less edge-bias etching. STRATA-GX also features an advanced aperturing system that allows for the placement of larger apertures on a substrate ensuring greater uniformity at higher etch rates. The aperturing system also helps in improving etch selectivity where en etch rate is higher for one material versus another. LAM RESEARCH STRATA-GX reactor provides unmatched throughput for high-volume device production and is also backwards compatible with most existing etch processing components. STRATA-GX is an ideal tool for device engineers looking to gain a competitive advantage in their etch production capabilities.
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