Used LAM RESEARCH STRATA-GX #293654487 for sale

LAM RESEARCH STRATA-GX is a next-generation reactor designed for plasma processing in semiconductor and other advanced materials applications. The reactor is a tandem-chamber type, allowing for precise control of plasma generation and processing conditions. The first chamber is home to a range of advanced thrusters, including an ion source, a neutralizer, and a neutral beam; these components enable the production of high-density plasmas with admirable power efficiency. The second chamber contains the primary process components, such as the electrodes, walls, shields, and etch or deposition targets. STRATA-GX reactor is designed with user-friendly automation and process control, with the aim of providing the highest possible level of performance and safety. All the necessary components, such as end-effectors, sensors, and analyzers, are integrated into the reactor to ensure optimal performance. The advanced process control algorithms enable precise real-time adjustment of process parameters, maximizing accuracy and repeatability. LAM RESEARCH STRATA-GX reactor also features advanced diagnostics for ensuring the quality of the plasma process. An array of diagnostics, such as beam current monitoring, plasma electron temperature measurement, chemical composition analysis, and substrate surface imaging, are integrated into the system for comprehensive process insight. Safety is also extensively taken into account with STRATA-GX reactor. The reactor is outfitted with a variety of safety features, such as temperature restrictions, chamber pressure monitoring, and plasma hazard containment. Furthermore, the reactor is equipped with a range of sophisticated safety protocols to detect and respond to any potential risk. LAM RESEARCH STRATA-GX reactor is an ideal system for numerous semiconductor and advanced materials processing applications, providing advanced process capabilities, accurate process monitoring and diagnostics, as well as comprehensive safety features. This reliable, field-proven system provides successful plasma processing results for the most demanding applications.