Used MRC / TEL / TOKYO ELECTRON Exim #293609622 for sale

It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.

ID: 293609622
Wafer Size: 12"
Vintage: 2017
PVD System, 12" Process: MRAM CIM: SEC Fab section: Thin film Handler: (4) Transfer Robots Factory interface: (3) FOUP Option: (4) PVD Chambers Cool Chamber Preclean Chamber NESLAB SWX100 Heat exchanger (2) UPS (5) Cryo compressors (2) Main MPD 2017 vintage.
MRC / TEL / TOKYO ELECTRON Exim is a type of reactor, specifically a chemical vapor deposition (CVD) tool that is used for the development of electronic components and materials. The reactor is designed to provide a high purity process chamber environment, a wide process range and precise process control. MRC Exim reactor is mainly used in the manufacture of semiconductor wafers and flat panel displays. TEL Exim reactor family consists of three types of machines, the XE100, XE200, and XE300, each designed to offer different functionalities. The XE100 is essentially a single wafer tool, and is an economical yet versatile platform that offers several batch processing capabilities. The XE200 is slightly more complex and is designed for high performance single wafer applications such as etching and deposition of complex oxides. And lastly, the XE300 model is the most advanced of the three, offering integration with MRC process control systems and full batch processing capability. TOKYO ELECTRON Exim reactor is mainly constructed from stainless steel, per the requirements of robust semiconductor manufacturing environments. The design includes a process chamber for the insertion and processing of the wafers, along with ports for plasma generation, injection of chemicals, heating elements and evacuation of byproducts. Additionally, there are safety features used to protect personnel from any hazardous materials and vapors generated during the process. The reactor is designed to support a range of process parameters, including rapid thermal annealing, MOCVD, PECVD, etching, and photoproduction processes. These processes are achieved by introducing necessary chemical precursors in a gaseous form, that can then be rapidly heated and activated to form the desired product. Through the precise manipulation of temperature, pressure, and the various gaseous environments in the chamber, incredibly precise and repeatable electronic components and materials can be developed. Exim family of reactors is a highly flexible and robust tool that can be used to create highly precise and reliable electronic components and materials. Through its wide range of process capabilities and its precise process control, this reactor is an invaluable tool to any modern semiconductor manufacturing facility.
There are no reviews yet