Used NOVELLUS 02-134264-00 #293663402 for sale

NOVELLUS 02-134264-00 Reactor is a state-of-the-art plasma processing equipment designed for high-performance etching and deposition applications. This advanced reactor utilizes ultra-high power plasma sources and dynamic process control, making it suitable for a wide range of substrates and materials. 02-134264-00 Reactor features an integrated plasma control platform, allowing for precision in-situ process monitoring. This platform monitors a variety of plasma parameters, such as ion current, RF power, source temperature, reactant distribution, etc., to ensure consistent etching and deposition operations. To further facilitate process optimization, the control platform can generate user-defined, real-time reporting functions. In terms of substrate compatibility, NOVELLUS 02-134264-00 Reactor is capable of etching and depositing on a wide range of surfaces, including metals, oxides, nitrides, and composites. The system's dynamic power range ensures reliable etching and deposition on a variety of surfaces and substrates. 02-134264-00 Reactor is also equipped with advanced safety features. Its integrated process safety unit monitors the reactor's temperature, pressure, and power levels to ensure that reliable and safe plasma processing operations are maintained. Furthermore, the reactor is UL Certified, ensuring that it meets all safety requirements. For its physical design, NOVELLUS 02-134264-00 Reactor is engineered with a high-precision miniature, radial gas distribution network. This highly efficient distribution network ensures that the plasma load is properly distributed throughout the chamber for optimal performance and reliability. The reactor also features a modular construction and a small footprint, making it easy to install and maintain. In summary, 02-134264-00 Reactor is an advanced plasma processing machine designed for etching and deposition applications. Its integrated plasma control platform ensures precision in-situ process monitoring. Its substrate compatibility and dynamic power range allows for reliable etching and deposition operations across a wide range of materials. The reactor is also equipped with advanced safety features to provide optimal safety for plasma processing operations. Finally, its high-precision radial gas distribution network and its small footprint make this unit easy to install and maintain.