Used NOVELLUS 02-267288-00 #293657512 for sale

NOVELLUS 02-267288-00 is a reactor that is used in the etching process in the semiconductor industry. This type of reactor is especially designed to provide a fast and precise etch rate with uniformity and reproducibility through the etched areas. 02-267288-00 reactor is utilized to remove deposited materials, as well as to put an exact design pattern onto the substrate. The reactor is a four-sectioned machine, which includes the load-lock chamber, the fill chamber, the plasma chamber and the exhaust chamber. The load-lock chamber loads and unloads the substrate into position for the plasma etch process. The fill chamber fills the plasma chamber with the specified etch gases, with precise volume control to ensure proper uniformity and process reproducibility. The plasma chamber operates under high-pressure, ultra-cold environment to provide high-uniformity etch rates. The exhaust chamber contains specialized exhaust baffles to contain the plasma deposition within the chamber. NOVELLUS 02-267288-00 reactor is capable of processing a wide range of substrates, including silicon-based, metal-based, nitrides, and other materials. The reactor is also able to accurately process substrates with blind or buried features. This ensures that the design pattern is preserved and exact etch rates are maintained across all areas of the substrate. The reactor uses high frequency powersupplies to generate an alternating electromagnetic field, which create a plasma. This plasma is then used to etch the substrate with the exact etch rate desired. The reactor is designed to etch with accuracy down to the nanometer scale, enabling the clean and reproducible removal of material. To maintain precise control over the etching process, 02-267288-00 reactor is also capable of monitoring critical parameters such as temperature, pressure, and RF power. The reactor can also detect process anomalies such as plasma instabilities or chemical imbalances. In the event of a process anomaly the reactor can take corrective action to ensure a stable and uniform etch rate. Overall, NOVELLUS 02-267288-00 reactor is a reliable and robust tool for the semiconductor etching process. The uniform etch rate and precise design pattern control ensures that the design pattern is preserved with high reliability. The reactor is capable of accurately etching with nanometer-scale accuracy and can detect any process anomalies in order to take corrective action quickly.