Used NOVELLUS Altus Chamber #9204833 for sale

NOVELLUS Altus Chamber is a revolutionary etching reactor designed to perform high-quality processes in the semiconductor fabrication units (Fabs) of chip foundries. This reactor is capable of providing optimal etching parameters to fabricate more complex, smaller chips ranging from 0.21 to 65nm gate sizes. The feature of this chamber is its fully symmetrical design that ensures uniformity of etch results across all wafer surface, regardless of their orientation. This symmetrical design is powered by electro-magnetic field technology, and is capable of maintaining a constant etch rate. The advantages of Altus Chamber are: high throughput, low cost-of-ownership, and highly adaptable. It is equipped with the latest plasma sources and controllers, capable of producing low-power etches with high uniformity and performance--efficiency as high as 400 wafers/hour, and greater than 30% reduction in PCB etch rate. The chamber can be configured to process multiple types of wafers simultaneously, which makes it well-suited for multi-application production. Furthermore, the chamber is compliant with international standards and the pressure and temperature inside the chamber can be precisely monitored at all times. The chamber utilizes dual-frequency RF generators, also known as induction RF. This enables the chamber to achieve high plasma density without compromising on etch rate or uniformity. Moreover, the chamber features a smart calibration system that automatically optimizes the wafer size parameters for each substrate. The controller enables a wide level of process monitoring and control, and provides a user-friendly interface for creating and tuning application-specific recipes. In addition, the chamber also has a safety system to ensure the safety of its operations. This system is monitored by sensors that monitor both physical and chemical parameters such as pressure and temperature. The chamber also has fail-safe mechanisms to prevent any abnormal conditions such as gas leakages and potential explosions. NOVELLUS Altus Chamber is a powerful etching chamber suitable for use in modern chip production lines. The high etch rate and low cost-of ownership make it a perfect choice for many chip foundries, and its fully symmetrical design ensures uniformity of the process while being able to process multiple types of wafer simultaneously. This chamber has a great user interface, making it easy for engineers to effectively configure and tune recipes. The safety sensors and protocols make sure that all operations are done in a safe manner, making Altus Chamber a reliable and optimal solution for any semiconductor fabrication needs.