Used NOVELLUS Altus #9261397 for sale

NOVELLUS Altus is a next-generation, advanced high-pressure chemical vapor deposition (HPCVD) reactor developed by NOVELLUS. It is the first equipment to bring HPCVD's thin-film deposition process to the ultra-high-pressure environment of 20 or more atmospheres. This revolutionary technology enables the deposition of high quality, homogeneous thin films with superior adhesion, excellent quality control, and low contamination. Altus is a multi-chamber system, meaning it features a main chamber and an in-situ process chamber that supports three separate gas delivery systems for deposition, cleaning, and annealing. It also offers an innovative high-pressure deposition module which offers precise control of the process conditions, from pressure and temperature to gas flow and mixing. The deposition process in NOVELLUS Altus can be tailored to suit various types of materials. It is highly efficient and ensures a uniform distribution of layer thicknesses across the substrate. Additionally, it offers low contamination levels, resulting in superior quality products with minimal defects. Altus is a very versatile unit and can be used for a wide range of thin-film deposition applications such as flat panel displays, semiconductor chips, and data storage devices. It is also designed to be energy efficient, with features such as energy recycled filtration, gas atomization, low-pressure CO2 scavenging, and valves designed to conserve energy. NOVELLUS Altus machine is very user-friendly and can be operated with ease. It is built with a safe and easy-to-use maintenance process andits intuitive user interface ensures quick operation and setup, reducing downtime. Overall, Altus is an advanced HPCVD reactor that provides excellent uniformity, low contamination, and ultra-high-pressure deposition capabilities for a wide range of thin-film applications. It is a highly efficient, versatile, and user-friendly tool for superior performance and superior thin films.