Used NOVELLUS Altus #9261414 for sale

NOVELLUS Altus is a high-performance, next-generation deposition coater designed for advanced materials deposition and etch processes. It uses a unique, advanced-architecture design to provide ultra-high material deposition rates and superior process control. Altus platform is designed for the fabrication of FinFETs, MEMS, 3D NAND, and other complex structures. NOVELLUS Altus can deposit and pattern layers with high film-thickness uniformity, as well as etch features with high precision and repeatability. Altus equipment combines hardware and software to provide precise material parameters, superior process control, and outstanding uniformity. The system features lithography and etch hardware, as well as advanced deposition modules. It utilizes an innovative dual-stage sequential reactor design, utilizing both rotary and linear mechanisms to allow for high-speed rotation of the coils. This provides a high degree of control over the deposition process, while allowing for greater uniformity in material properties. The unit can also be configured for various film types, including conformal, re-sputter, and shadowing. It uses a unique two-step measurement process to provide truly accurate film-thickness uniformity. Furthermore, the conformal deposition step allows for the creation of three-dimensional shapes with finely-controlled feature sizes. NOVELLUS Altus platform also features a fast, accurate alignment machine for precise film registration, and a proprietary, advanced-architecture deposition boat for superior coating uniformity. It also has a high-speed film throughput capability, so that even large layers can be processed quickly and accurately. In addition to its hardware components, Altus tool uses proprietary software to control the deposition process. The software has options for automatic pellicle loading, smart pump-down optimization, feature registration, and many other features tailored to the requirements of each specific process. NOVELLUS Altus is a revolutionary product that offers users the power of high-precision, high-throughput, and high-uniformity deposition and etch processes. Its advanced architecture enables it to handle a wide range of processes for the fabrication of the most advanced electronics products.