Used NOVELLUS C2-CVDD Concept 2 #293648738 for sale

NOVELLUS Concept 2 CVDD (Chemical Vapor Deposition) reactor is a state-of-the-art multi-chamber chemical vapor deposition equipment designed to deposit thin films at high rates and with high uniformity. This system utilizes a unique chamber design to achieve fast deposition rates and a low temperature range of operation to enable thicker films to be deposited. The Concept 2 CVDD unit consists of a load-lock chamber and a wafer transfer chamber which are used to transfer process wafers in and out of the deposition process chamber. The load-lock chamber is also used for direct wafer loading and transfer, meaning that manual loading and unloading are not required. This helps to reduce contamination and makes the CVDD machine easier to use. The deposition process chamber is a multi-chamber tool consisting of a gas pre-mix chamber, a deposition chamber, and a gas storage chamber. The gas pre-mix chamber is used to mix a precursors and an inert carrier gas prior to entry into the deposition chamber. By pre-mixing the precursors this process helps ensure uniformity of the deposition process. The deposition chamber is where the actual deposition of the thin film is performed. This chamber is designed to operate at a low set temperature, typically around 500C to enable thicker films to be deposited. The gas storage chamber is used to store gas at the required pressure and temperature. This helps reduce the amount of gas used during operation. The entire CVDD asset is controlled by a computer model, which is used to manage the deposition process and monitor the results. NOVELLUS Concept 2 CVDD equipment is a reliable and repeatable process that is used in a wide range of industrial and research applications. This system is capable of depositing thin films ranging from 10nm to 500nm in thickness. Additionally, this unit can deposit transparent, reflective, and opaque thin films depending on the application. NOVELLUS Concept 2 CVDD machine is a reliable and versatile tool for depositing thin films.