Used NOVELLUS C2-Sabre #293634852 for sale

NOVELLUS C2-Sabre is a wet station used in advanced semiconductor processing applications. It is a versatile tool that can be used to etch and isotropically clean wide range of substrates, such as silicon, glass, ceramics, and quartz. The tool consists of a processing chamber, a turbo-pumped exhaust system, and a variety of external pumps and valves. The system also includes bevel angle controllers an electron-beam source for specimen treatment and analysis, and a high-resolution control system for controlling the various chamber components. C2-Sabre operates in two modes: wet etching and isotropic cleaning of certain substrates. It has two main features that differentiate it from other wet etching systems: a pre-clean process, which uses a water-based surfactant solution prior to etching, and an aggressive cleaning process, which uses an active organic-chemical mixture to rapidly remove unwanted materials. The pre-clean process helps to achieve a uniform etch profile. It is accomplished by introducing a solution of water and surfactant onto the substrate and activating it with an ultraviolet light. This helps to break up the surface tension on both the targeted material and on the substrate surface, allowing easier etch removal of both materials. NOVELLUS C2-Sabre's aggressive cleaning process uses a highly aggressive mixture of ammonium hydroxide and hydrogen peroxide, along with certain additives, to strip and strip-out the surface materials from the substrate. This is achieved by utilizing plasma-assisted chemical etching (PACE) in which the reaction of the chemical agents is induced by a low-voltage-paced electric field. The PACE helps increase the rate of chemical reaction and thus, faster etch rate of the targeted material. C2-Sabre's electron-beam source allows for analysis, characterization and repair of various substrates and surfaces. The beam is tuned to the substrate's characteristics to provide a series of scans, which capture information related to surface topography, film morphology and any other surface-specific characteristics. Additionally, electron-beam-generated heating can be used to evaporate, reflow and re-alloy background materials, allowing errors to be removed and circuitry to be changed without any mechanical intervention. NOVELLUS C2-Sabre is a highly reliable tool with robust software and hardware components. It offers flexibility and accuracy in many steps of semiconductor device fabrication. It offers excellent yields, fast throughput and low operating costs, making it an ideal choice for advanced process applications.