Used NOVELLUS Chambers for Inova #9282131 for sale

Manufacturer
NOVELLUS
Model
Chambers for Inova
ID: 9282131
Wafer Size: 12"
Vintage: 2012
Metal PVD system, 12" 2012 vintage.
NOVELLUS Chambers for Inova is a reactor designed for the processing of advanced materials. This reactor is a PECVD chamber built with a 330 MHz, 8 kW induction plasma generator. It has a 66 cm deep cylindrical chamber, and a top plate designed to contain the HF plasma at a pressure range of 0.3 - 0.7 Torr. This chamber is ideal for fabrics that require high rates of deposition and uniformity at high temperatures. The reactor is capable of achieving a large range of temperatures, from 20°C up to 1100°C, which allows for a wide range of processes to be run in this chamber. The core of Chambers for Inova is the induction plasma generator, which is a key component for the reliable operation of the chamber. The plasma generator employs a multi-channel transformer that converts an AC power supply into a DC supply in order to increase the reliability and power of the plasma. The AC current is then passed through a number of coils, creating an electric field to generate the plasma. This equipment is designed with the power and bandwidth to ensure that the plasma remains consistent for the duration of the deposition process. The chamber also boasts a dynamic control system that is designed to monitor and control the plasma parameters in order to ensure uniformity within the chamber. The control unit monitors the level of channel potentials within the plasma generator, as well as monitoring the pressure within the chamber. Additionally, the control machine is also capable of adjusting the power of the plasma in order to minimize the risk of damage to the materials that are being processed. NOVELLUS Chambers for Inova is designed to be highly efficient, as it is capable of achieving high deposition rates at temperatures as low as 20°C. Additionally, the chamber is capable of achieving uniform deposition rates over large surface areas with a very low deposition rate errors. This reactor is an ideal choice for fabricating high-performance advanced materials, due to its combination of high accuracy and efficiency.
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