Used NOVELLUS CONCEPT 2 Altus 2 #9093687 for sale

Name: NOVELLUS CONCEPT 2 Altus 2
Brand: NOVELLUS
SKU: 9093687
Availability: InStock

URL successfully copied!

Reactors

Manufacturer

NOVELLUS

Model

CONCEPT 2 Altus 2

ID: 9093687

Wafer Size: 8"

Chamber, 8" Facility and Interface: Altus module locations: Dual: Port 2 and 3 WTS (backbone) facilities connection configuration: Bottom facilities installation Remote interconnect cables: 75 feet Modular power distribution [MPD, DUAL, ALTUS, C2PDP]: 01-298450-11 DLCM-S: ROBOT ASSY, MAG7, BISYMMETRIK ARM, DLCM: 02-262359-00 Transfer module to chamber valve (SMC Valve): 02-121427-00 Throttle valve kit, DLCM-S: 04-048579-02 Loadlock gate valve, SMC: 02-133799-00 Readiness kit: Dual altus ready Software/Controls: Module controller type: 02-272554-00, MC3 System controller type: 02-267883-00, MC3 System software (QNX): 5.1 DLCM-S IOC: 0 - IOC - 4.1 2 - IOC - 4.1 3 - IOC - 4.1 Altus IOC: 0 - SIOC - 4.30 1 - SIOC - 4.30 2 - SIOC - 4.30 3 (MPD) - SIOC - 4.10 Chase UI Kit: 02-117110-00 Process Chamber configuration: SHWRHD, 200 mm, Style B: 03-00258-00 ASSY, PED, 200 mm MOER, D.3, SEMI: 02-033134-01 EXCL RING, 200 mm, 2.0 mm OH SEMI: 15-032777-00 Indexer plate, HUB: 15-034848-00 INDEXCER, WF, EXCL, OPTION, 200 mm: 15-00934-02 Spindle assembly: 02-126697-00 OPT ENDPT DET'R, MSTR, ALT-S: 04-0120458-00 Throttle Valve MKS (Pressure control valve): 27-250285-00 Gate valve, vat: 60-10015-00 Gas box configuration (CESCVD02177B): Manifold A 1: Aera FC-7800CD, AR/2 SLM Manifold A 3: Aera FC-7800CD, H2/20 SLM Manifold B 6: Aera FC-7800CD, C2F6/2 SLM Manifold B 7: Aera FC-7800CD, O2/2 SLM Manifold D 2: Aera FC-7800CD, SiH4/100 SCCM Manifold H D: Aera FC-7800CD, Ar/20 SLM Manifold W 4: Aera FC-7800CD. AR/20 SLM Manifold W 5: Aera FC-7800CD, WF6/1 SLM Manifold C 8: Aera FC-7800CD, Ar/10 SLM Manifold C 9: Aera FC-7800CD, H2/20 SLM Baratron: Altus, CAP MANOMETER, HEATED 100 TORR: 27-10340-00 Altus, CAP MANOMETER, HEATED 10 TORR: 27-10343-00 Altus, Backside, CAP MANOMETER< HEATED 100 TORR: 27-10340-00 DLCM-S, LOADLOCK, CAP MANOMETER, HEATER 100 TORR: 27-10340-00 DLCM-S, TM, CAP MANOMETER, HEATED 100 TORR: 27-10340-00 Supporting remote units: (1) Process pump per process chamber: BOC Edwards, IH1000 - x2 for process pump typical (1) Pedestal pump per process chamber: BOC Edwards, i80 - x2 for pedestal pump typical (1) TM pump per system: BOC Edwards, i80 - x1 for TM pump typical (1) LL pump per system, BOC Edwards, i80, x1 for LL pump typical.

Read More Close

NOVELLUS CONCEPT 2 Altus 2 is a dual frequency, dual source version of NOVELLUS CONCEPT 2 Reactor platform. This reactor is supervised by a two-stage, flat-panel monitor and modular control equipment, making it highly efficient and easy to manage. It features two separately adjustable sources of high frequency energy, allowing a wide range of process control. It has advanced speed control capabilities which enable precision process control and uniformity across the wafer. This reactor also has the ability to make accurate temperature and gas flow adjustments, further enabling the exact process requirements for specialized thin-film depositions. CONCEPT 2 Altus 2 reactor is based on the traditional inductively coupled plasma process. It is a single-source II-V based, low-pressure, planar reactor that uses self-bias to induce the plasma. The system runs at two frequencies; 13.65 MHz for the lower source and 27.3 MHz for the higher source. The dual frequency setup allows for more control of the process and improved performance. The two frequency setup also allows for the use of multiple gas streams, enabling precision control of deposition processes. The purpose-built panel mounted monitor and control unit is user-friendly and efficient. It offers tight control of the deposition process thanks to full process monitoring and streamlined parameter handling. The multi-heated substrate port allows for maximum flexibility when developing processes. It has built-in safety features that allow the operator to safeguard against unwanted process changes due to operator errors or equipment changes. NOVELLUS CONCEPT 2 Altus 2 reactor provides users with a reliable and efficient machine for conducting advanced research studies. It features a flexible, modular design that enables rapid prototyping and laboratory-scale production. Its comprehensive control tool ensures that processes are conducted according to the strictest specifications. This state-of-the-art reactor is continuously upgraded in order to keep up with the latest technologies and needs in the IC manufacturing industry. CONCEPT 2 Altus 2 reactor is a dependable and efficient tool for fabricating various kinds of thin-film structures.