Used NOVELLUS CONCEPT 2 Altus 2 #9093688 for sale

Name: NOVELLUS CONCEPT 2 Altus 2
Brand: NOVELLUS
SKU: 9093688
Availability: InStock

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Reactors

Manufacturer

NOVELLUS

Model

CONCEPT 2 Altus 2

ID: 9093688

Wafer Size: 8"

Chamber, 8" Facility and Interface: Altus module locations: Dual: Port 2 and 3 WTS (backbone) facilities connection configuration: Bottom facilities installation Remote interconnect cables: 75 feet Modular power distribution [MPD, DUAL, ALTUS, C2PDP]: 01-298450-11 DLCM-S: ROBOT ASSY, MAG7, BISYMMETRIK ARM, DLCM: 02-262359-00 Transfer module to chamber valve (SMC Valve): 02-121427-00 Throttle valve kit, DLCM-S: 04-048579-02 Loadlock gate valve, SMC: 02-133799-00 Readiness kit: Dual altus ready Software/Controls: Module controller type: 02-272554-00, MC3 System controller type: 2-267883-00, MC3 System software (QNX): 5.1 DLCM-S IOC: 0 - IOC - 4.1 2 - IOC - 4.1 3 - IOC - 4.1 Altus IOC: 0 - SIOC - 4.30 1 - SIOC - 4.30 2 - SIOC - 4.30 3 (MPD) - SIOC - 4.10 Chase UI Kit: 02-117110-00 Process Chamber configuration: SHWRHD, 200 mm, Style B: 03-00258-00 ASSY, PED, 200 mm MOER, D.3, SEMI: 02-033134-01 EXCL RING, 200 mm, 2.0 mm OH SEMI: 15-032777-00 Indexer plate, HUB: 15-034848-00 INDEXCER, WF, EXCL, OPTION, 200 mm: 15-00934-02 Spindle assembly: 02-126697-00 OPT ENDPT DET'R, MSTR, ALT-S: 04-0120458-00 Throttle Valve MKS (Pressure control valve): 27-250285-00 Gate valve, vat: 60-10015-00 Gas box configuration (CESCVD02177B): Manifold A 1: Aera FC-7800CD, AR/2 SLM Manifold A 3: Aera FC-7800CD, H2/20 SLM Manifold B 6: Aera FC-7800CD, C2F6/2 SLM Manifold B 7: Aera FC-7800CD, O2/2 SLM Manifold D 2: Aera FC-7800CD, SiH4/100 SCCM Manifold H D: Aera FC-7800CD, Ar/20 SLM Manifold W 4: Aera FC-7800CD. AR/20 SLM Manifold W 5: Aera FC-7800CD, WF6/1 SLM Manifold C 8: Aera FC-7800CD, Ar/10 SLM Manifold C 9: Aera FC-7800CD, H2/20 SLM Baratron: Altus, CAP MANOMETER, HEATED 100 TORR: 27-10340-00 Altus, CAP MANOMETER, HEATED 10 TORR: 27-10343-00 Altus, Backside, CAP MANOMETER< HEATED 100 TORR: 27-10340-00 DLCM-S, LOADLOCK, CAP MANOMETER, HEATER 100 TORR: 27-10340-00 DLCM-S, TM, CAP MANOMETER, HEATED 100 TORR: 27-10340-00 Supporting remote units: (1) Process pump per process chamber: BOC Edwards, IH1000 - x2 for process pump typical (1) Pedestal pump per process chamber: BOC Edwards, i80 - x2 for pedestal pump typical (1) TM pump per system: BOC Edwards, i80 - x1 for TM pump typical (1) LL pump per system, BOC Edwards, i80, x1 for LL pump typical.

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NOVELLUS CONCEPT 2 Altus 2 is a reactor technology designed to optimize industrial processing efficiency. This reactor is a process tool enhanced with features that allow for improved reliability, better processing accuracy and faster throughput. The reactor operates over a large temperature range and offers a number of useful features for the industrial sector. The basic configuration of CONCEPT 2 Altus 2 reactor includes several parts: the body, the gate, the emitter, the control enclosure and the wafer boat. The body of the reactor is made out of a durable material to ensure longevity and safety. The gate of this reactor is a key component - it is the part where low-energetic ions enter the equipment. The emitter of this reactor works in conjunction with the gate to emit charged particles that are necessary for the deposition and etching process. The control enclosure houses the power supply, temperature control and data logging systems that allow the user to optimize the process. Finally, the wafer boat is the part which houses the target material and allows it to be transferred into the system for processing. In the process of deposition and etching, the user has to adjust the temperature range, the power levels and the pressure levels. For this, NOVELLUS CONCEPT 2 Altus 2 reactor offers a number of useful features. The state-of-the-art temperature controller maintains the temperature accurately within the designated range while the power regulator adjusts the level of power input according to the requirement of the unit. This process can also be monitored and adjusted by the data logging machine available with this reactor. Overall, CONCEPT 2 Altus 2 reactor is a reliable and efficient process tool with useful features for industrial processing. It ensures accuracy, speed and safety during the deposition and etching operation. This reactor also provides a large temperature range to suit the needs of different industries.