Used NOVELLUS CONCEPT 2 Altus 2 #9093689 for sale

NOVELLUS CONCEPT 2 Altus 2 reactor is a chemical vapor deposition (CVD) reactor equipment used to coat the surface of semiconductor devices. This CVD reactor is designed specifically for process geometries of 20nm and below, making it ideal for the development of features in advanced memory and logic devices. The unique design of the Altus 2 reactor ensures optimal results for all deposition needs. The Altus 2 reactor utilizes a linear robot motion system. This motion unit allows for precise deposition of materials at a rapid rate. The accelerated linear motion machine is coupled with a high efficiency gas delivery tool. This asset provides rapid flow of gases to the reactor surface, enabling fast, accurate depositions. The Altus 2 reactor is capable of performing multiple depositions simultaneously. It features a dual source capability, enabling both dielectric and metal deposition at the same time, or several different materials at the same time. This enables quick turnaround of deposition tasks and lower production turnaround time. The advanced process control model of the Altus 2 reactor ensures uninterrupted deposition within tight tolerances. The equipment can store several recipes which can be easily recalled for rapid process changes. The build-in "clean and safe" feature of the Altus 2 reactor ensures that any process changes do not contaminate or damage the sensors and other components of the reactor. The unique design of the Altus 2 reactor is optimized for maximum performance and uniformity of deposition. The patented uniform gas delivery system ensures uniformity on any substrate size or shape. The three zone heating mechanism of the Altus 2 reactor minimizes thermal damage and ensures uniform process results to the substrate. The Altus 2 reactor is designed with advanced user safety features. The onboard monitoring systems of the Altus 2 reactor can detect and alert users to any potential safety issues, enabling quick resolution. The process chamber design prevents leaks, ensuring an oxygen free environment for safe operation of the reactor. Overall CONCEPT 2 Altus 2 reactor is an advanced CVD reactor unit designed specifically for semiconductor devices. With its unique linear robot motion machine, efficient gas delivery tool, and advanced process control asset, the Altus 2 reactor is a reliable and accurate device for any deposition needs.