Used NOVELLUS Concept 2 Altus Shrink #293777488 for sale

NOVELLUS Concept 2 Altus Shrink is a state-of-the-art plasma-enhanced ultra-high-vacuum deposition reactor designed to provide precise thin-film deposition capabilities to the semiconductor industry. It is a highly advanced equipment comprised of a chamber, bellows, chamber damping, bellows damping, fast and coarse pitch resistor drive, and cooling assembly. The chamber is an ultra-high-vacuum environment for reactive gas deposition, equipped with all necessary vacuum pumps and isolation valves. It is connected to the lift system, lid, fast pitch drive, and bellows for gas entry. The interior of the chamber is coated with a nano-ceramic insulator to enhance the unit's lifetime and maintain high energy efficiency. A large quartz window enables visual inspection of the substrate during the deposition process. At the heart of the machine is a fast pitch drive, which allows precise speed control and higher throughputs, with multiple power configurations. An integrated high frequency matching network increases deposition uniformity and reduces waste. The bellows are designed to minimize stress and distortion of the thin film layers, and damping the bellows provide increased protection during the deposition process. Concept 2 Altus Shrink is capable of high-desity copper deposition, with an optimized through-put rate and advanced fine pitch control, along with maximum fundamental frequency rates up to 5 MHz. The reactor's fine pitch control ensures uniformity and increases throughput, while enabling heavy copper layers at higher deposition rates than ever before. NOVELLUS Concept 2 Altus Shrink is also highly process-stable, allowing for accurate thin-film deposition on the substrate. The cooling assembly utilizes multiple liquid cooling jackets and precision thermocouples to maintain the optimal temperature for deposition. This minimizes sidewall erosion and increasing the lifetime of the thin-film layers, further increasing the tool's energy efficiency. Concept 2 Altus Shrink is an ultra-high-vacuum deposition reactor that offers both precise thin-film deposition and increased energy efficiency through its advanced technology, chamber design, and cooling assembly. Its fast pitch drive and bellows damping allow for high-density copper deposition with uniformity and increased throughputs, making it an ideal choice for those in the semiconductor industry.