Used NOVELLUS CONCEPT 2 Altus #166554 for sale

NOVELLUS CONCEPT 2 Altus is a state-of-the-art reactor designed for applications in advanced materials deposition for semiconductor manufacturing and MEMS fabrication. The reactor offers a wide range of capabilities and is one of the most powerful and reliable reactors in the market. It is well suited for depositing uniform thin films with lowest stress levels and high refractive index variations. The Altus utilizes a vacuum processing chamber and an electron beam (E-beam) source. A high-power electron gun operating at up to 60 kilovolts (kV) is used to remove unwanted material from surfaces prior to deposition process. This process allows the layers to adhere more tightly to the substrate and increases the resultant thin film's stability. It also allows for the deposition of materials that are otherwise difficult to deposit with conventional methods. The system includes a SmartCard, which is an interface for easy parameter setting. It is a highly configurable platform, allowing for deposition process recipes to be programmed based on user's specification. Additionally, CONCEPT 2 Altus is equipped with advanced controllers and computers for full automatic process control. This gives access to different functions ranging from simple adjustments to more complicated parameters. The reactor can handle all kinds of materials including metals, dielectrics, and compounds. The deposition process is achieved by either Langmuir-Blodgett (LB) or atomic layer deposition (ALD). The LB process is suited for thin films with small molecule-size and the ALD process is optimized for producing complex stable oxides. NOVELLUS CONCEPT 2 Altus also features an energy management system (EMS) which reduces energy consumption during the thin film deposition process. This helps reduce operation and maintenance costs and leads to improved production yield. Additionally, the converter and emitter are highly durable when compared to alternatives, meaning less downtime and less replacement parts required. CONCEPT 2 Altus is the best option for users looking for high-performance, low-cost deposition capabilities. Its advanced features make it suitable for virtually any application requiring the deposition of thin films or alternative coatings. Furthermore, the combination of the high-powered E-beam source, SmartCard interface, and computer automation makes it one of the most reliable reactors for materials deposition.