Used NOVELLUS CONCEPT 2 Altus #293627308 for sale

NOVELLUS CONCEPT 2 Altus (Altus) is a type of reactor that uses a unique dual plasma chamber design to support advanced processing technologies. This design helps to optimize the equipment's ability to perform numerous processes, such as deposition and etching, with increased efficiency and precision. The Altus reactor utilizes two chambers which create two distinct plasma environments. The first chamber operates at high power, producing a high-temperature, high-density plasma, while the second chamber operates at lower power, emitting a lower-temperature, lower-density plasma. This dual-chamber design gives Altus unrivaled flexibility to support a wide range of deposition and etching processes with high uniformity of coverage and quality. The Altus is also capable of sustaining an extremely stable processing environment, which helps reduce variations in the process parameters and therefore generates superior process uniformity in terms of film grain, doping concentration, and process repeatability. This performance is achieved through a sophisticated sheath flow management system which divides the sheath gas between the two chambers, controlling and optimizing both the deposition and etching processes at each stage. It is important to note that the Altus reactor is not only a strong performer when it comes to fabrication but is also extremely durable. The reactor is constructed with high quality materials that ensure that it is resistant to process-induced abrasion and can be used for longer periods of time. Additionally, the internals of the Altus reactor use advanced composites materials that also help to reduce its overall maintenance costs. In conclusion, CONCEPT 2 Altus reactor is an advanced, versatile, and reliable piece of equipment that can support large-scale or small scale fabrication processes. Its wide range of supported processes, superior process uniformity, and its durable construction make it an ideal choice for many fabrication establishments.