Used NOVELLUS CONCEPT 2 Altus #9159135 for sale

NOVELLUS CONCEPT 2 Altus is a single-wafer chemical vapor deposition (CVD) reactor specifically designed for the deposition of advanced thin films on semiconductor substrates. It is used in the manufacturing of high-end integrated chips and other electronic devices. The reactor uses plasma enhanced CVD (PECVD), a process that creates a highly controlled and uniform thin film across the wafer. The process begins with a heated gas entering the reaction chamber filled with a high-density field of ions. Reactant gases are then injected and diminished by the ions to form a thin film on the substrate surface. The reactor is designed to be a turnkey system, with easy installation and tight process control. The process parameters can be adjusted quickly and precisely—to ensure that deposition cycles run at optimum speeds with minimised production costs. CONCEPT 2 Altus is capable of running multiple process chambers and has a maximum temperature of 800°C. It has a high efficiency and chemical uniformity, and a large targetted coverage area, making it ideal for advanced thin film deposition. Processes that can be performed on the reactor include etching, film deposition, and oxidation of semiconductor substrates. Additionally, by using multiple process chambers the reactor is able to perform a variety of simultaneous thin film deposition jobs. The reactor is also equipped with a remote diagnostics interface, allowing operators to monitor and troubleshoot the system remotely and quickly. NOVELLUS CONCEPT 2 Altus is an efficient and advanced reactor, ideal for the deposition of thin films on SMC and other semiconductor substrates. It has an advanced temperature and process control system, capable of providing tight and uniform thin film deposition over the entire work surface. Additionally, its multi-chamber design allows for simultaneous thin film deposition, providing maximum productivity for thin film fabrication. With a remote diagnostics interface and a maximum temperature of 800°C, CONCEPT 2 Altus is an ideal tool for advanced thin film deposition jobs.