Used NOVELLUS CONCEPT 2 Altus #9191508 for sale

NOVELLUS CONCEPT 2 Altus is a high-temperature metal-organic chemical vapor deposition (MOCVD) reactor developed by NOVELLUS Systems, Inc. that is specifically designed for advanced semiconductor manufacturing processes. Specifically, the reactor is designed for producing improved dielectrics and metal layers for integrated circuits on non-silicon substrates. The reactor is based on a tubular hot-wall design which enables precise control of both temperature and deposition rate. The nozzle can sustain high temperatures of up to 1000°C and its small size allows for extremely precise control and high-purity results. Its temperature-controlled chamber is well insulated, enabling precise and stable process results even when subjected to temperature fluctuations from the outside environment. CONCEPT 2 Altus is among the most advanced in NOVELLUS Systems' line of MOCVD reactors. Its advanced computer control equipment enables the precise control of a variety of parameters such as line width, thickness, and surface roughness. It also allows for precise control of film composition, thereby allowing for more advanced applications such as deposition of ultra-thin layers and uniform alloy films. NOVELLUS CONCEPT 2 Altus also uses an innovative thermal spray cooling technology for enhanced performance. The integrated cooling system delivers enhanced stability and uniformity of results. The thermal spray also allows for higher throughput rates and improved unit uptime. Additionally, the active vacuum pumping machine ensures fast pumpdowns, thereby reducing the time spent between process runs. Overall, CONCEPT 2 Altus is an advanced and reliable MOCVD reactor specifically designed to meet the needs of the most stringent semiconductor manufacturing processes. Its innovative design and computer control tool enable precise control over a range of parameters and film composition, allowing for more complex technologies and applications. Additionally, its integrated thermal spray cooling asset and active vacuum pumping model drastically improve its performance, making it an invaluable asset in the semiconductor industry.