Used NOVELLUS CONCEPT 2 Altus #9248936 for sale

NOVELLUS CONCEPT 2 Altus reactor is a chemical vapor deposition (CVD) tool used to deposit exceedingly thin films onto substrates. It is equipped with an automated loadlock equipment, top and bottom gas delivery, an ozone-based cleaning system, an advanced 3-d reactor, and a high precision temperature control unit. The automated loadlock machine facilitates the loading and unloading of substrates into the chamber, which greatly simplifies the process and increases accuracy. The "top and bottom gas delivery" refers to the gas delivery tool which comprises a showerhead, dual showerheads and wall injectors that allow high deposition rates while allowing precise control of distribution. The advanced 3-d reactor is specifically designed for higher process uniformity and improved film deposition rate. This asset replaces many of the other traditional wafer ovens used to deposit films on substrates. It also provides precision temperature control, enabling the deposition of films accurately and uniformly. The ozone-based cleaning model offers premium maximum cleanliness for residue-free deposition. The oxidation process eliminates particles and organics from the chamber walls and surfaces before deposition thus improving film quality. The high precision temperature control equipment enables extremely accurate temperature control, enabling deposition of films accurately and uniformly. It also provides the ability to reduce deposition time and improve substrate quality. Overall, CONCEPT 2 Altus reactor is a powerful CVD tool with advanced features specifically designed to improve film quality, reduce deposition time and increase process accuracy. With its loadlock system, gas delivery unit, advanced 3-d reactor and high precision temperature control, the Altus reactor will deliver consistent, quality films on a range of substrates.