Used NOVELLUS CONCEPT 2 Altus #9268202 for sale

NOVELLUS CONCEPT 2 Altus is a state-of-the-art high-density reactor that is used in the semiconductor industry to manufacture complex integrated circuits. It is a plasma-enhanced chemical vapor deposition (PECVD) equipment that is designed to process multi-layer or multi-stack substrates quickly and efficiently. With its advanced deposition capabilities, CONCEPT 2 Altus can be used in a variety of applications, including the production of thin films, high-k dielectrics, and interlayer dielectrics. NOVELLUS CONCEPT 2 Altus uses a hybrid magnetically-coupled plasma source that combines capacitively coupled plasma (CCP) and inductively coupled plasma (ICP) sources for maximum flexibility and consistent film quality. The reactor's proprietary no-mainframe-power control helps to reduce drift and to keep process parameters consistent over long runs, helping to ensure that each device produced is of the highest quality possible. CONCEPT 2 Altus is designed to be highly process adaptable, allowing the user to adapt to a broad range of process challenges such as nucleation, uniformity and step coverage. The enhanced gas delivery system is designed to provide rapid gas switching and uniform gas flux distributions across each substrate. By utilizing a gate valve and proprietary precision upstream gas delivery modules, NOVELLUS CONCEPT 2 Altus can offer uniform deposition across the entire substrate and ensure that the films produced have optimal step coverage and uniformity. CONCEPT 2 Altus also features a series of leashing components including inlet and outlet pressure controllers, a quartz amplifier, an adjustment heat resistors, and a thermocouple for temperature control. This impressive array of features ensures uniformity and precision across the substrates. NOVELLUS CONCEPT 2 Altus is the ideal reactor for semiconductor manufacturing. It is a reliable, cost-effective, and highly adaptable unit that offers consistently high quality films and optimal step coverage across all substrates. With its advanced magnetically-coupled plasma source, adjustable gas delivery machine, and powerful leashing components, CONCEPT 2 Altus is the perfect tool to ensure consistently reliable products and uniformity.