Used NOVELLUS CONCEPT 2 Altus #9377394 for sale

NOVELLUS CONCEPT 2 Altus is a physical vapor deposition (PVD) reactor designed to enable deposition of a variety of materials onto substrates. It is suitable for a range of applications, including the deposition of metals, semiconductors, ceramics and low-k dielectric films. The Altus is an innovatively advanced PVD tool that offers a high throughput and flexibility with a wide selection of films and material deposition techniques. The Altus has a state-of-the-art design, with a dual linear-magnet source configuration, vacuum-pressure vessel and filamentless process chamber. The dual linear-magnet source configuration places the source of materials directly in the process chamber, creating a plasma that is highly energetic and uniform. This plasma allows the deposition of high-quality films with precise control over the film thickness and composition. The vacuum-pressure vessel further enhances uniformity of the process, allowing for fine-tuning of the process parameters. The filamentless process chamber provides superior uniformity and reliability, as well as improved process flexibility. It features hybridized process options, allowing for process parameters to be changed as needed without any optical characterization of the material prior to deposition. This enables multiple target materials and deposition processes to be used without any system modifications. CONCEPT 2 Altus also features an in-situ optical emission spectroscopy (OES) system. The OES allows for instantaneous monitoring of the plasma, including temperature and composition, allowing operators to make real-time adjustments to the process. By providing real-time data on the deposition, the Altus ensures a consistently high-quality film and reproducible performance. Overall, NOVELLUS CONCEPT 2 Altus is an advanced PVD reactor that is well suited to many applications. It offers advanced technology that enables precise control over the material deposition, with minimal optical characterization of the target material. Additionally, the advanced in-situ optical emission spectroscopy allows for real-time monitoring of the process, ensuring high-quality, reproducible results.