Used NOVELLUS CONCEPT 2-CVDD-S #293776222 for sale

NOVELLUS Concept 2 CVDD S is a chemical vapor deposition (CVD) reactor designed specifically for depositing semiconductor materials. It is a single wafer, ultrahigh vacuum chamber, which produces thin films of semiconductor material using a low-pressure gas mixture of precursors. The precursor gas is drawn into the chamber and is then heated and decomposed by high temperatures generated in the chamber. This generates a vaporous compound which deposits onto the substrate at a uniform thickness. Concept 2 CVDD S provides mixed-mode processing capabilities and can deposit nitrides, oxides, polysilicon, and SRD metals. It also allows for fast, automated wafer handling for maximum throughput and features an automated recipe set-up function that enables rapid conversion between ingredients for mixed-mode deposition. NOVELLUS Concept 2 CVDD S utilizes a cutting edge design to provide ultrahigh deposition rate performance and superior uniformity. It features a rigid wafer boat structure coupled with an optimized two-grid power delivery equipment that reduces Voltage-Down Time (VDT) and enables steady-state process control. The chamber is sealed with a metallic bellows gate valve for superior vacuum maintenance while the power delivery system provides high uniformity and highly repeatable processes. Additionally, the unit features a fully automated substrate transferring mechanism for improved wafer-handling efficiency. Concept 2 CVDD S also features an advanced computerized process control machine with programmable variables such as gas flow rates, pressure, temperature, power, and flux. It also offers a wide range of process monitoring functions and tuning capabilities that enable precise process control and fast production. Additionally, the tool is economical, reliable, and low in maintenance. In summary, NOVELLUS Concept 2 CVDD S is an ultrahigh-vacuum, single wafer, CVD reactor which offer superior deposition rates, precise control, and excellent uniformity. It is ideal for a wide range of semiconductor applications and boasts features such as an automated substrate transferring mechanism, a two-grid power delivery asset, programmable parameters, and a range of process monitoring functions. It is also economical, reliable, and low in maintenance.