Used NOVELLUS CONCEPT 2 Dual Altus 2 #9093690 for sale

NOVELLUS CONCEPT 2 Dual Altus 2 reactor is a chemically enhanced physical vapor deposition (CEPVD) reactor used for the production of high-volume semiconductor device products. It is based on a modular architecture that supports different applications in various dynamic configurations. The reactor is designed with a dual chamber, allowing for high-rate deposition in one chamber and lower rate deposition in the other chamber. This allows the reactor to maintain a high throughput while reducing consumable costs. The reactor has a unique thermally unmatched design that separates the wafer process chamber from the source chamber, so that high-rate deposition is not affected by thermal variations in the source chamber. This thermal isolation enables efficient thermal management and consistent deposition rates. Additionally, CONCEPT 2 Dual Altus 2 uses a split-deposition chamber that enables the deposition of different layers within the same chamber. This split-chamber design enables the reactor to be more easily integrated into the semiconductor production line. NOVELLUS CONCEPT 2 Dual Altus 2 reactor utilizes a custom-crafted quartz tube which provides superior load handling, temperature uniformity, and uniform deposition rates. It has an advanced on-wafer temperature monitoring system (OWTM) to ensure reliable uniformity and taylorgraphy performances. The advanced OWTM is capable of detecting fast spikes in temperature over nanoseconds, allowing for the control of thermal gradients across a single wafer. This helps to ensure that the processes are running consistently and reliably by monitoring and displaying the real-time temperature data for each wafer. A key advantage of CONCEPT 2 Dual Altus 2 reactor is its capability to handle multiple precursor batches. This allows the reactor to process wafers with different platform advancements in a single batch. The introduction of upstream gas mixing systems also allows NOVELLUS CONCEPT 2 Dual Altus 2 to adjust various process parameters, such as pressure, temperature, and gas flow in real-time, which enables more accurate control of complex deposition processes. Overall, CONCEPT 2 Dual Altus 2 is a proven and reliable CVD reactor that offers excellent uniformity and production rates. It's ability to handle multiple precursor batches, along with its advanced on-wafer temperature monitoring system, make it an ideal choice for the production of high-volume semiconductor device products.