Used NOVELLUS CONCEPT 2 Dual Altus 2 #9093691 for sale

Name: NOVELLUS CONCEPT 2 Dual Altus 2
Brand: NOVELLUS
SKU: 9093691
Availability: InStock

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Reactors

Manufacturer

NOVELLUS

Model

CONCEPT 2 Dual Altus 2

ID: 9093691

Wafer Size: 8"

Chamber, 8" Facility and Interface: CVD tungsten Wafer type: SEMI Wafer cassette type: A198-80MB-47C02 - Fluoroware DLCM-S Heater manometers: Yes Altus module locations: Dual, Port 2 and 3 Facilities configuration: Bottom Remote interconnect cable length: 75 feet Transfer Module A Port location: Center Module B Port locationL Right Primary user interface: Adjacent user interface DLCM-S: Modular power distribution [MPD, DUAL, ALTUS, C2PDP]: 01-298450-11 Robot Assy, Mag7, Bisymmetrik arm, DLCM: 02-262359-00 Transfer module to chamber valve (SMC valve): 02-121427-00 Throttle valve kit, DLCM-S: 04-048579-02 Loadlock gate valve, SMC: 02-133799-00 Readiness kit (if ordered as a single altus): Dual Altus ready Software/Controls: Module controller type: 02-272554-00 (MC3) System controller type: 02-267883-00 (MC3) System software (QNX): 5.1 DLCM-S IOC: 0: Type: IOC, Firmware: 4.1 2: Type: IOC, Firmware: 4.1 3: Type: IOC, Firmware: 4.1 Altus IOC: 0: Type: SIOC, Firmware: 4.30 1: Type: SIOC, Firmware: 4.30 2: Type: SIOC, Firmware: 4.30 3 (MPD): Type: IOC, Firmware: 4.10 Chase UI Kit: 02-117110-00 Process Chamber Configuration: SHWRHD, 8", Style B: 03-00258-00 Assy, PED, 8" MOER, D.3, Semi: 02-033134-01 Excl ring, 8", 2.0 mm Oh, Semi: 15-032777-00 Indexer plate, HUB: 15-034848-00 Indexer, WF, Excl, Option, 8": 15-00934-02 Spindle assembly: 02-126697-00 Opt endpt det'r, MSTR, Alt-S: 04-120458-00 Throttle valve MKS (Pressure control valve): 27-250285-00 Gate valve: 60-10015-00 Gas Box Configuration: A Manifold: 1: Aera FC-7800 CD, Ar / 2 SLM 3: Aera FC-7810 CD, H2, 20 SLM B Manifold: 6: Aera FC 7810 CD, C2F6 / 2 SLM 7: Aera FC 7800 CD, O2 / 2 SLM D Manifold: 2: Aera FC-7800 CD, SiH4 / 100 SCCM H Manifold: D: Aera FC-7810 CD, Ar / 20 SLM W Manifold: 4: Aera FC-7810 CD, Ar / 20 SLM 5: Aera FC-7800 CD, WF6 / 1 SLM C Manifold: 8: Aera FC 7810 CD, Ar / 10 SLM 9: Aera FC 7810 CD, H2 / 20 SLM Baratron: Altus, CAP Manometer, Heated 100 Torr: 27-10340-00 Altus, CAP Manometer, Heater 10 Torr: 27-10343-00 Altus, Backside, CAP Manometer, Heated 100 Torr: 27-10340-00 DLCM-S, Loadlock, CAP Manometer, Heated 100 Torr: 27-10340-00 DLCM-S, TM, CAP Manometer, Heated 100 Torr: 27-10340-00 Supporting remote units: (1) Process pump per process chamber: BOC Edwards Ih1000 (1) Pedestal pump per process chamber: BOC Edwards i80 (1) TM Pump per system: BOC Edwards i80 (1) LL Pump per system: BOC Edwards i80.

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NOVELLUS CONCEPT 2 Dual Altus 2 is a state-of-the-art reactor equipment designed for rapid and efficient etch processing. It is specially designed to provide quick response times and superior control of etch processes in order to increase production yields. CONCEPT 2 Dual Altus 2 is built on a single, common substrate platform with an integrated chamber layout, allowing for flexibility and optimization of the processing parameters. This platform can accommodate up to four etch chambers in order to meet the increasing complexity of device requirements and applications. NOVELLUS CONCEPT 2 Dual Altus 2 provides configurable plasma power, gas flow, pressure, and temperature controls in order to precisely control the etching processes. The etch process can be tailored to meet specific customer requirements, and the system maintains tight control over profile shape, layer thickness, depth, and aspect ratio. CONCEPT 2 Dual Altus 2 utilizes the latest in plasma etch technology, including a unique MESA (Multi-Etching Source Assisted) process that enables an extremely high etch rate and highly anisotropic etch profiles. The built-in plasma sources utilize both capacitive coupling as well as inductive coupling, allowing for improved process flexibility and improved profile control. The unit is also equipped with an automated plasma and monitor machine, which enables precise control of etch parameters. Additionally, the tool is equipped with integrated gas distribution systems for uniform gas flow as well as integrated temperature control to ensure precise temperature control of the etch process. NOVELLUS CONCEPT 2 Dual Altus 2 provides excellent process uniformity and repeatability while meeting very demanding throughput demands. The asset also features advanced diagnostic capabilities, as well as an extensive set of process monitor options. The model has been extensively qualified to ensure reliable high-quality results in a wide range of etch processes and materials. This equipment is also capable of extremely high-volume throughput, which allows for flexible manufacturing and shorter cycle times with minimal downtime. CONCEPT 2 Dual Altus 2 provides an advanced and flexible etch solution that meets the demands of a wide variety of industry applications.