Used NOVELLUS Concept 2 Dual Altus Shrink #9242193 for sale

NOVELLUS Concept 2 Dual Altus Shrink reactor is a powerful and versatile tool for use in semiconductor device fabrication. This advanced piece of equipment is perfect for creating high-performance, low-power integrated circuit devices. It is a dual-chamber reactor design, with both chambers dedicated to different tasks. The upper chamber is for shrink etching, and the lower chamber is for low-power directional etching. The shrink etching process in the upper chamber allows for two-dimensional device features to be reduced in size while still keeping their characteristic. This is an important component in the fabrication of small, fast integrated circuits. The process is performed using magnetically-enhanced plasma sources and highly efficient dual-prism etch valves, allowing the device features to be etched quickly and at low power consumption. The lower chamber is the directional etching chamber. This chamber utilizes chemically assisted ion implantation (CAI) for the directional removal of material from the surface of a device. This is useful for patterning structures or features, such as thin interconnect lines or contact holes. Since the process is very precise, this makes the directional etching process much more efficient. Concept 2 Dual Altus Shrink reactor requires periodic maintenance and recalibration to ensure peak performance, and the manufacturer provides technical support to enable this. Cleaning solutions are available for removing graphite and other particulates that can build up over time, and the sophisticated software package available with the device makes calibration and maintenance easy. Overall, NOVELLUS Concept 2 Dual Altus Shrink reactor is a powerful and flexible tool for the fabrication of advanced integrated circuit devices. Its combination of shrink etching and directional etching capabilities, plus its user-friendly maintenance and calibration software, make it an ideal choice for semiconductor device design engineers.