Used NOVELLUS CONCEPT 2 Dual Altus #9093684 for sale

ID: 9093684
CVD System Standard and PNL chamber Shrink chambers Frame has PNL option Module controller: MC1 P166 QNX4 IOC Version: 4.1 Shuttle type SMC L-motion slit valve Verify end point detector RFG 3000 Generator Power rack: MSSD.
NOVELLUS CONCEPT 2 Dual Altus Reactor is a dual sputter device with a unique featureset designed for the most demanding etch and deposition applications. It combines reactive already capability with superior process control to ensure consistent high-quality results. NOVELLUS CONCEPT-2 DUAL ALTUS' unique AC/DC/O2 control, combined with Field Emission Source (FES) technology for retarding deposition, increases the quality and uniformity of coatings over large areas. CONCEPT 2 Dual Altus is built on the same frame as it's predecessor, the Concept 1, but has several enhanced features: dual cages for twice as much surface area being treated, increased accuracy in sputtering, improved multiple plasma sources, and an additional O2 source. The dual-cage sputtering design reduces the possible electric field, resulting in an incredibly uniform deposition and increased film homogeneity. By inserting a Faraday cage between the plasma source and the wafer, CONCEPT-2 DUAL ALTUS is capable of tightly controlling the work area's plasma environment to prevent arcing and contamination. In addition, NOVELLUS CONCEPT 2 Dual Altus features a suite of advanced process control options for accurately controlling deposition rate, uniformity, and thickness. Through the use of real-time feedback and advanced process algorithms, NOVELLUS CONCEPT-2 DUAL ALTUS can consistently produce a superior quality product. Additionally, CONCEPT 2 Dual Altus features a more efficient design for improving process repeatability and has dramatically reduced O2 consumption for a greener process. Finally, CONCEPT-2 DUAL ALTUS is nimble and versatile in a wide range of process environments, with a modular design that can be easily modified for different applications. This versatility and expandability allows customers to upgrade and/or expand their existing Fact10 environment to include NOVELLUS CONCEPT 2 Dual Altus and its advanced capabilities. Whether used for enhanced deposition and etch processes or specialized specialized applications, NOVELLUS CONCEPT-2 DUAL ALTUS is an exceptional tool capable of producing consistently high-quality results.
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