Used NOVELLUS CONCEPT 2 Dual Sequel Express #9223972 for sale
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ID: 9223972
System
User interface: C2-SCON5995
Wafer shape: Flat / Notch
No SMIF interface
No aligner option
Module A / B: Express
Process A: ARC
Process B: AEC
Load lock baratron model: Convectron
Index robot type: Index 2
TM Robot type: Mac 7
TM Robot blade: Metal
Wafer sensor: Existence
Signal tower
No fab installation
Module controller: MC1
Host interface: SECS
EMO: Push button
Front monitor: System UI LCD
Back monitor: CRT
No load lock dry pump
Slit valve insert
Slit valve type: SMC L-Motion
No TM dry pump
TM Throttle valve model: Millipore
TM Baratron model: MKS
Module A / B:
Chamber type: Express
Module controller: MC1
Chamber process: ARC
IOC Version:
IOC1 / 4.1
IOC2 / 4.1
IOC3 / 4.1
Manometer 1(10T): MKS
Manometer 2(1000T): MKS
Process clean type: Normal
HF Generator: AE RFG5500
LF Generator: AE PDX1400
RF Match: Mercury
Heater block type: (6) Stations
End point option: Dual head
Spindle top plate type: (6) Pieces
Spindle type: Ferrofluidic
Foreline gate heat option
Foreline gate valve: HVA
Throttle valve: MKS 2538-15665
Throttle valve heat option
Liquid IOC version: 4.1
No module dry pump
RF Isolation box missing
Pearl kit missing (N2O Treatment kit)
Gas / MFC Size / MFC / Model
N2 / 5 / SLM / Awra FC7800CD
N2 / 10 / SLM / Awra FC7800CD
N2O / 20 / SLM / Awra FC7800CD
NH3 / 10 / SLM / Awra FC7800CD
SÌH4 / 1 / SLM / Awra FC7800CD
O2/CF/ 20 / SLM / Awra FC7800CD
PH3/N2 / 2 / SLM / Awra FC7800CD
N2O / 1 / SLM / Awra FC7800CD
C2F6 / 5 / SLM / Awra FC7800CD
System:
Main power: 208 V, 3 Phase, 5 wires
UPS power: 120 V, 3 Phase, 3 wires.
NOVELLUS CONCEPT 2 Dual Sequel Express is a reactor that is used for chemical processes and coatings. It is equipped with two inner rotating tubes and a flat downstream deposition chamber. It is designed to maximize throughput while providing maximum performance. The main components of CONCEPT 2 Dual Sequel Express are the upper and lower vapor jet injectors, the concentric ramp and baffle plates, the downstream shower and the high pressure water/gas streams. The upper and lower vapor jet injectors spray atomized precursors into the reaction chamber, which are then heated and reacted upon. The concentric ramp and baffle plates increase the residence time of the reaction mixture, allowing a greater degree of reaction between all the components. The downstream shower is designed to allow for deposition of any reaction product on the inner and outer walls of the reaction chamber. Finally, the high pressure water/gas streams ensure a uniformity of reaction within the chamber. NOVELLUS CONCEPT 2 Dual Sequel Express has the capability to process a variety of materials, such as acrylics, oxides, silicones, nitrides, carbides, and others. It can be used for chemical vapor deposition (CVD), physical and chemical vapor deposition (PECVD), and sputter deposition. CONCEPT 2 Dual Sequel Express also has the ability to process thermal deposition operations. NOVELLUS CONCEPT 2 Dual Sequel Express also offers an advanced level of control, analytics, and safety features. It is equipped with a remote production monitor, allowing users to track the highest process parameters to ensure precision control. It also has an integrated touch screen for improved user interface and data logging. The data acquisition system provides data and analysis of real-time production in the reactor chamber, giving an indication of process uniformity. Finally, CONCEPT 2 Dual Sequel Express also has safety features such as process shut-off valves and emergency shut-down buttons. Overall, NOVELLUS CONCEPT 2 Dual Sequel Express offers an efficient and safe method of chemical processing and coating. The advanced level of control offered ensures precision and uniformity during any process. The remote production monitor and integrated touch screen make the process highly user-friendly, leading to increased efficiency.
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