Used NOVELLUS CONCEPT 2 Dual Sequel Express #9223972 for sale

ID: 9223972
System User interface: C2-SCON5995 Wafer shape: Flat / Notch No SMIF interface No aligner option Module A / B: Express Process A: ARC Process B: AEC Load lock baratron model: Convectron Index robot type: Index 2 TM Robot type: Mac 7 TM Robot blade: Metal Wafer sensor: Existence Signal tower No fab installation Module controller: MC1 Host interface: SECS EMO: Push button Front monitor: System UI LCD Back monitor: CRT No load lock dry pump Slit valve insert Slit valve type: SMC L-Motion No TM dry pump TM Throttle valve model: Millipore TM Baratron model: MKS Module A / B: Chamber type: Express Module controller: MC1 Chamber process: ARC IOC Version: IOC1 / 4.1 IOC2 / 4.1 IOC3 / 4.1 Manometer 1(10T): MKS Manometer 2(1000T): MKS Process clean type: Normal HF Generator: AE RFG5500 LF Generator: AE PDX1400 RF Match: Mercury Heater block type: (6) Stations End point option: Dual head Spindle top plate type: (6) Pieces Spindle type: Ferrofluidic Foreline gate heat option Foreline gate valve: HVA Throttle valve: MKS 2538-15665 Throttle valve heat option Liquid IOC version: 4.1 No module dry pump RF Isolation box missing Pearl kit missing (N2O Treatment kit) Gas / MFC Size / MFC / Model N2 / 5 / SLM / Awra FC7800CD N2 / 10 / SLM / Awra FC7800CD N2O / 20 / SLM / Awra FC7800CD NH3 / 10 / SLM / Awra FC7800CD SÌH4 / 1 / SLM / Awra FC7800CD O2/CF/ 20 / SLM / Awra FC7800CD PH3/N2 / 2 / SLM / Awra FC7800CD N2O / 1 / SLM / Awra FC7800CD C2F6 / 5 / SLM / Awra FC7800CD System: Main power: 208 V, 3 Phase, 5 wires UPS power: 120 V, 3 Phase, 3 wires.
NOVELLUS CONCEPT 2 Dual Sequel Express is a reactor that is used for chemical processes and coatings. It is equipped with two inner rotating tubes and a flat downstream deposition chamber. It is designed to maximize throughput while providing maximum performance. The main components of CONCEPT 2 Dual Sequel Express are the upper and lower vapor jet injectors, the concentric ramp and baffle plates, the downstream shower and the high pressure water/gas streams. The upper and lower vapor jet injectors spray atomized precursors into the reaction chamber, which are then heated and reacted upon. The concentric ramp and baffle plates increase the residence time of the reaction mixture, allowing a greater degree of reaction between all the components. The downstream shower is designed to allow for deposition of any reaction product on the inner and outer walls of the reaction chamber. Finally, the high pressure water/gas streams ensure a uniformity of reaction within the chamber. NOVELLUS CONCEPT 2 Dual Sequel Express has the capability to process a variety of materials, such as acrylics, oxides, silicones, nitrides, carbides, and others. It can be used for chemical vapor deposition (CVD), physical and chemical vapor deposition (PECVD), and sputter deposition. CONCEPT 2 Dual Sequel Express also has the ability to process thermal deposition operations. NOVELLUS CONCEPT 2 Dual Sequel Express also offers an advanced level of control, analytics, and safety features. It is equipped with a remote production monitor, allowing users to track the highest process parameters to ensure precision control. It also has an integrated touch screen for improved user interface and data logging. The data acquisition system provides data and analysis of real-time production in the reactor chamber, giving an indication of process uniformity. Finally, CONCEPT 2 Dual Sequel Express also has safety features such as process shut-off valves and emergency shut-down buttons. Overall, NOVELLUS CONCEPT 2 Dual Sequel Express offers an efficient and safe method of chemical processing and coating. The advanced level of control offered ensures precision and uniformity during any process. The remote production monitor and integrated touch screen make the process highly user-friendly, leading to increased efficiency.
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