Used NOVELLUS CONCEPT 2 Dual Sequel Express #9249030 for sale

NOVELLUS CONCEPT 2 Dual Sequel Express is a high-performance, dual-platen, batch process reactor designed specifically for the deposition process in semiconductor device fabrication. It features two independent, self-graded platen chambers that can be operated in tandem or in series allowing up to four process steps in one chamber (i.e., sputter, etch, CVD, etc.) to be simultaneously performed. The sequential process allows for the highest throughput of any NOVELLUS reactor. The total capacity of the Dual Sequel Express stands at approximately 60 wafers per hour, with a maximum of 8 wafers forming the process recipe. The equipment offers outstanding uniformity with a high throughput. In addition, the workspace is highly adjustable which allows users to tailor the processes to optimize layer uniformity and improve deposition reproducibility. The Dual Sequel Express also incorporates a sophisticated automated product tracking system and parametric controls to ensure that all uniformity requirements of the process recipe are achieved. It also features a gas distribution unit which optimizes gas mixing and atomization. By adjusting the injection speed and pressure, the Dual Sequel Express offers an increased level of control over the processes occurring in the chamber. The design of the Dual Sequel Express ensures that it can be used in a variety of materials and dielectrics production processes. It is compatible with materials such as p-type and n-type Si, SiGe, and SiC. Additionally, the machine is well-equipped to support advanced materials such as carbon nanotubes, graphene, and other nanomaterials. Furthermore, the Dual Sequel Express reactor boasts an intuitive user interface that allows users to easily monitor and control all processes in the reactor. This intuitive interface makes it possible for operators to quickly and accurately set up new recipes and easily troubleshoot any issues that arise. It also features self-diagnostics for predictive maintenance, boosting the reliability of the tool. Overall, CONCEPT 2 Dual Sequel Express is an advanced dual-platen, batch process reactor designed for the deposition process in semiconductor device fabrication. It features two independent, self-graded platen chambers for simultaneous operation, a sophisticated automated product tracking asset, a gas distribution model, an intuitive user interface, and self-diagnostics for predictive maintenance. Its capacity stands up to 60 wafers per hour with a maximum of 8 wafers for the process recipe, and its adjustable workspace allows users to tailor the process to ensure uniformity and reproducibility.