Used NOVELLUS CONCEPT 2 Dual Sequel Express #9281506 for sale

NOVELLUS CONCEPT 2 Dual Sequel Express (DSX) reactor is a specialized, dual chamber, single wafer processing equipment designed specifically for applications requiring high precision, repeatability and control. The design provides two distinct chambers, with isolated deposition and other processing systems, capable of operating independently or concurrently. The DSX reactor offers one of the highest levels of process control and precision available among all process tools. This is primarily achieved through advanced material management and process control technologies, including multiple, independent motor controllers which provide precise control of wafer movement and process steps. In addition, the DSX can detect in-wafer features down to 45nm resolution with minimal sample perturbations, and its advanced Vacuum Chamber Controller can precisely monitor and maintain low pressure conditions in real time. The DSX network is designed to optimize the number of process uniformity cycles and control process steps. Its Recipe Optimization capability allows the user to modify and re-optimize recipes at run-time. This provides the user with maximum control over process uniformity and consistency when adjusting process parameters in real-time. The DSX reactor also offers multiple process tools, such as wet etching, dry etching, and chemical/physical vapor deposition (CVD/PVD). Its wet etching system can process up to 10 different chemistries in a single pod or tank, allowing for maximum yield and uniformity of process. The CVD/PVD module is ideal for high material deposition rates and precise control in order to achieve a highly uniform device structure. The DSX unit requires periodic maintenance, including such activities as gas line verifying, chemical installation and replenishment, and general machine configuration. During this process, a technician should take special care to verify the integrity of the chamber and the process lines before proceeding to the next step. To ensure the safety of operators, the DSX provides protection against potentially hazardous vapors, sparks and fires, and has an onboard monitoring tool to check for the presence of gases and particles. In short, CONCEPT 2 Dual Sequel Express (DSX) reactor is an innovative, dual chamber, single wafer processing asset designed to provide highly precise and repeatable processes with maximum control. Its advanced motor and vacuum controllers, material management capabilities, recipe optimization, and process tools offer operators a powerful and reliable platform to ensure consistent and successful processing.