Used NOVELLUS Concept 2 Dual Speed Sequel #9237572 for sale

NOVELLUS Concept 2 Dual Speed Sequel is an advanced physical vapor deposition (PVD) reactor that is designed to produce high-quality coatings on various products. This reactor is equipped with dual magnetic-confinement arcs that produce high-energy ions, allowing for fast sloping of the depositing layer. It also features two-speed deposition, meaning that it can quickly switch between high and low deposition rates. This flexible and energy-efficient reactor can be used in various industries to coat products that range from medical and optical parts to automotive parts and semiconductors. Concept 2 Dual Speed Sequel PVD reactor is composed of a chamber, which can accommodate a wide range of substrates, and a controller, which includes the power supplies. The chamber is internally lined with gas ports for proper confining of the plasma. It can accommodate multiple substrates at once, so production rate is high. Vacuum operation is possible due to the use of two stages of rechargeable cryo pumps. An integrated resistive heater can further increase substrate temperature, if needed. At the heart of NOVELLUS Concept 2 Dual Speed Sequel PVD reactor is the arc chamber. It consists of a double wall stainless steel construction, and the arc chamber is equipped with two arc electrodes, each with multiple anodes. It is also equipped with an ion source. The arc chamber is back-filled with an inert gas, allowing for fast slope and precise control of deposition. The controller of Concept 2 Dual Speed Sequel PVD reactor is connected to the arc chamber and has separate power supplies for each of the two arc electrodes. It can also be controlled manually or via computer. It includes software that allows for optimal control of the deposition processes, such as preparing the parameters depending on the type of substrate and the desired coating characteristics. NOVELLUS Concept 2 Dual Speed Sequel PVD reactor is a highly-advanced PVD system that produces high-quality coatings that are extremely durable and conform to various standards. Thanks to its user-friendly interface and flexible deposition capabilities, this reactor is ideal for various industrial applications that require precise coating and precise control.