Used NOVELLUS Concept 2 Dual Speed Sequel #9281515 for sale

NOVELLUS Concept 2 Dual Speed Sequel is a chemical vapor deposition (CVD) reactor designed to deposit thin films used in semiconductor device fabrication. This dual pressure and dual temperature reactor uses two pumps to control the reactant concentration, and to control the temperatures within the chamber. The dual pressure pump provides greater gas flow control, which is ideal for optimizing CVD applications. Concept 2 Dual Speed Sequel is a polysilicon deposition reactor; it features a high pressure high-speed reaction zone that has two pumps between the processing chamber and the gas delivery plenum. The first pump is the precursor gas pump, which conveys the precursors used in the process. The second pump is the reaction pressure pump, which maintains a constant pressure within the reaction zone, thereby allowing precise control of the reactant concentration. NOVELLUS Concept 2 Dual Speed Sequel also features a high-speed, low-pressure reaction zone that is equipped with two properly sized flow valves. The first valve is the low pressure valve, which regulates the introduction of process gases into the reaction chamber, and the second valve is the high pressure valve, which adjusts the residence time and concentration of the process gases. These two valves allow for precise manipulation and control of the film deposition rate and film quality. Concept 2 Dual Speed Sequel has a dual temperature insert to enable efficient heating and cooling. The dual temperature insert helps to optimize the temperature profiles within the reactor, thus allowing for higher production yields. The insert is equipped with closely spaced heater elements that allow uniform temperature control and quick temporal response. These elements also provide uniform temperature through the entire reaction zone. NOVELLUS Concept 2 Dual Speed Sequel has an advanced controller unit with an intuitive and easy-to-use user interface. This controller has a Graphical User Interface (GUI), which allows for detailed process parameter manipulation. This GUI also offers real-time monitoring capability, and allows the user to adjust process parameters on the fly. Concept 2 Dual Speed Sequel is an advanced CVD reactor system that facilitates efficient and precise deposition of thin films. Its dual pressure and dual temperature system provides precise control over the process parameters, while the close temperature control enables a higher production yield. The advanced controller system is also a welcome addition, as it allows for real-time process manipulation. All these features make NOVELLUS Concept 2 Dual Speed Sequel an ideal tool for thin film deposition.