Used NOVELLUS Concept 2 Dual Speed Sequel #9301537 for sale

NOVELLUS Concept 2 Dual Speed Sequel reactor is a revolutionary semiconductor processing system designed to improve the efficacy and speed of industrial manufacturing processes. This automated system brings with it a wide range of benefits, making it ideal for modern-day production. The reactor is constructed of three main components: the deposition chamber, the CVD (Chemical Vapor Deposition) chamber and the cooling chamber. The deposition chamber features a quad-pass deposition substrate process, which allows materials to be applied with great accuracy. The CVD chamber includes a temperature-controlled chamber with vacuum pump and a gas manifold to ensure perfect conditions for the reaction. The cooling chamber allows the reactor to be continuously maintained and monitored without interrupting the process. This reactor is capable of depositing multiple layers at different rates, allowing for a wide range of products to be developed. For instance, copper can be deposited at different rates depending on its purpose in the product. This multi-level deposition also helps reduce cycle time as layers can be deposited faster than traditional reactors. Concept 2 Dual Speed Sequel reactor is highly efficient. It features a variable pump design, which helps to reduce costs and increase production efficiency. It also has an ergonomically designed chamber with a low noise level, making it a preferred choice for product developers. NOVELLUS Concept 2 Dual Speed Sequel reactor is an ideal choice for any industrial production line. It ensures greater accuracy and speed while reducing waste and costs. Its durable construction and automated processes make it ideal for efficient production.