Used NOVELLUS CONCEPT 2 Dual Speed #9096020 for sale

NOVELLUS CONCEPT 2 Dual Speed is a high-performance gas-driven reactor developed by NOVELLUS Systems, Inc.to meet a variety of industrial semiconductor manufacturing requirements. The reactor is designed to process high-volume wafer products in one continuous system and offer two speeds of operation. The Dual Speed version includes two sets of chambers that can perform both long-duration low-pressure processes and shorter duration high-pressure processes. The two-speed setup allows for maximum throughput and flexibility in wafer processing. It utilizes a high-efficiency gas-fluxed process technology, which is capable of achieving extremely low chamber pressures due to low gas load. The closed loop gas system is designed to reduce process-related gas consumption and operating costs. The reactor is equipped with advanced cryogenic systems to help maintain high-precision control over wafer temperatures. The Dual Speed also includes integrated flow control to optimize the reactor environment and ensure precise process control. The reactor's design is based on a modular architecture. The maximum chamber size is 22ins x 14ins with a total of 8 chambers, allowing for efficient wafer processing while utilizing minimal space. Each chamber can hold up to 16 4-inch wafers or 8 6-inch wafers for increased manufacturing capacity. Each chamber is also equipped with dedicated temperature control and precise gas delivery for optimal process control. CONCEPT 2 Dual Speed reactor also features integrated robotics for seamless wafer handling. The robot arm is programmed with an intuitive user interface, allowing for easy operation and fast wafer transfer times. The robot arm features a centralized storage area and can simultaneously handle up to 48 wafers- per-cycle. Overall, NOVELLUS CONCEPT 2 Dual Speed reactor is a powerful, advanced gas-driven system designed to meet industrial semiconductor manufacturing requirements. With two-speed operation, efficient space management, sophisticated temperature control, precise gas delivery, intuitive user interface, and integrated robotics, this reactor has the capabilities to satisfy rigorous wafer processing requirements.