Used NOVELLUS CONCEPT 2 Sequel Dual Express #9361977 for sale

NOVELLUS CONCEPT 2 Sequel Dual Express is a type of large-scale chemical vapor deposition (CVD) reactor used in the production of integrated circuits. The reactor is a dual-chamber design that can run in tandem, allowing for multiple layers of silicon dioxide (SiO2) and other materials to be deposited in a single process. The concept 2 sequel reactor is designed to provide an efficient and cost-effective means for chipmakers to build integrated circuits. The reactor consists of two chambers: a process chamber and a reload chamber. The process chamber is where the actual deposition of the layers of materials takes place; the reload chamber houses the deposition tools and materials. The chambers are connected by a series of pipes and valves, allowing for the movement of materials into and out of the process chamber. Each chamber is equipped with its own set of temperature, pressure, and gas flow sensors and controllers. CONCEPT 2 Sequel Dual Express reactor is designed to operate in a 'dual express' mode, in which two deposition steps are carried out simultaneously. This enables the deposition of two layers of materials at once, allowing for much faster and efficient manufacturing process times. It also enables the deposition of materials with different properties, such as crystal orientation, without having to switch between different deposition chambers. The reactor is powered by a 300mm torch heating system with advanced temperature and uniformity control, allowing for precise control of furnace temperatures. It also utilizes advanced gas delivery systems and particulate filtration and trapping. These features combine to provide a reliable and repeatable CVD process. The reactor is designed for use in the production of integrated circuits, such as transistor gate oxides, passivation layers, and contact layers. The concept 2 sequel reactor is designed to operate in both research and manufacturing settings, where it can provide a reliable solution to the growing demand for high-performance integrated circuits. With its advanced features, the reactor provides the capability to produce quality-assured, high-performance devices in a more cost-effective manner than traditional deposition processes.