Used NOVELLUS CONCEPT 2 Sequel Express #9256798 for sale

Name: NOVELLUS CONCEPT 2 Sequel Express
Brand: NOVELLUS
SKU: 9256798
Availability: SoldOut

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Reactors

Manufacturer

NOVELLUS

Model

CONCEPT 2 Sequel Express

ID: 9256798

Wafer Size: 8"

System, 8" Process type: PEOX (2) Chambers LCD Monitor, 12.1" Signal tower type: Front Mount DLCM: P166/64M Module controller Cassette transfer: Shuttle type TM Robot: Magnatran 7 003-1600-25 Indexer robot: Indexer type II Motor type: Belt Animatics: CDP2407-2 Arc bar: 26 Slots Cassette mapping: Auto mapping MKS 750B11TCE2GK 10 Torr Manometer GRANVILLE PHILLIPS 275 Mini convectron TYLAN ACX3200 Throttle valve controller Slit valve type: Loadlock VAT/CH SMC IOC: 27-10157-00 Ver4.1 CVD1: ADVANCED ENERGY MN3150274-004 B RF Match network View port left/Right RF Distribution Gas distribution Mix bowl type: Not heated (6) Shower heads Heater block Process chamber ring MESC Flange MKS 627A13TBC Manometer, 1000 Torr MKS 627A11TBC Manometer, 10 Torr UE PV48W-14 Switch, vacuum, atmosphere UE E48W-H14 Switch, vacuum, 15 Torr End point detector VM3200 Integrated dual wavelength EPD (3) IOC: 27-10157-00 Ver 4.1 Controller, throttle valve Interlock PCB, CVD 02-123072-00 Rev A P166/64M Module controller Water flow switch Gate valve, Hi vac, 4" Throttle valve Spindle mechanism Ferrofluidic bellows type Process chamber 4-line type: Vertical Process chamber exhaust type: Vertical EUROTHERM Temperature controller Hastings gauge ADVANCED ENERGY PDX 1400, P/N 27-028379-00 F/R C RF Generator ADVANCED ENERGY RFG 5500, P/N 27-115617-00 F/R A Generator rack CVD2: ADVANCED ENERGY MN3150274-004 B RF Match network View port left/Right RF Distribution Gas distribution Mixbowl type: Temperature setting (6) Shower heads Heater block Process chamber ring MESC Flange MKS 627A13TBC Manometer, 1000 Torr MKS 627A11TBC Manometer, 10 Torr UE PV48W-14 Switch, vacuum, atmosphere UE E48W-H14 Switch, vacuum, 15 Torr End point detector VM3200 Integrated dual wavelength EPD (3) IOC: 27-10157-00 Ver 4.1 Controller, throttle valve Interlock PCB, CVD 02-123072-00 Rev A P166/64M Module controller Water flow switch Gate valve, Hi vac, 4" Throttle valve Spindle mechanism Ferrofluidic bellows type Process chamber 4-line type: Vertical Process chamber exhaust type: Vertical EUROTHERM Temperature controller Hastings gauge ADVANCED ENERGY PDX 1400, P/N 27-028379-00 F/R C RF Generator ADVANCED ENERGY RFG 5500, P/N 27-115617-00 F/R A Generator rack CVD1 / CVD2: MFC (AERA): SiH4 / FC-7800CD, 1 SLM N2 / FC-7800CD, 5 SLM He / FC-7800CD, 10 SLM NH3 / FC-7800CD, 10 SLM O2 / FC-7800CD, 20 SLM C2F6 / FC-7800CD, 5 SLM N2O / FC-7800CD, 20 SLM N2 / FC-7800CD, 10 SLM SSD: MSSD 01-132945-00 with UPS Power: 208 VAC, 3 Phase, 5 wires, 50 Hz, 1000 kV 208 VAC (CVCF), Single phase, UPS 50 Hz, 20 A.

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NOVELLUS CONCEPT 2 Sequel Express is an advanced deposition reactor designed to deliver optimal process flexibility and maximum uptime for the deposition of dielectric, barrier, and metal films. Its highly efficient design allows for faster wafer throughput at considerably higher film deposition rates. The reactor utilizes a range of tubular reactors, specifically designed to ensure cost-effective process flexibility and superior control. Its advanced features include high-speed pulsing, decreased cycle times, and the ability to precisely manage film deposition and uniformity across the wafer. The reactor has a tubular processing chamber that is divided into four individually programmable flux regions into one continuous tube. This provides the ability to deposit multiple films in a single cycle or process different layers in different flux regions. The chamber is capable of supporting pressures ranging from vacuum to pressure, as well as temperatures from room temperature to 500°C. In addition, it allows for wafer handling in both horizontal and vertical orientations. The reactor has an advanced closed-loop process control equipment that delivers precise process management to manage the deposition rate, layer uniformity, and deposition rate profile. It includes algorithms such as feedback and feedforward control, which ensure that all of these aspects are accurately adjusted during processing. The system also allows for remote monitoring and control of the process. CONCEPT 2 Sequel Express is designed to have a low-cost of ownership as well as advanced safety features. It is designed to offer maximized productivity while also minimizing any potential safety risks. It is equipped with a Self-Protection Unit as well as Error Prevention and Limiting features to ensure safe operation of the machine at all times. Finally, this reactor is designed to deliver cost-effective film deposition solutions in short cycle times. It is able to support a wide variety of materials and is capable of automatically changing tool sets, making it a highly configurable and versatile tool. With its advanced control and safety features, high wafer throughput, and cost-effectiveness, NOVELLUS CONCEPT 2 Sequel Express is the ideal choice for a variety of deposition applications.