Used NOVELLUS CONCEPT 2 Sequel Express #9259413 for sale

NOVELLUS CONCEPT 2 Sequel Express is a chemical vapor deposition (CVD) reactor, designed for the deposition of special thin-film material layers on substrates in the semiconductor industry. The equipment is capable of deposition rates from 80 to 160 nm/min, with a wafer size of 300 mm or larger. It is used for applications such as inter-metallic barriers, ultra-thin interconnects, and liner applications for copper and tungsten metallizations. The reactor utilizes the state-of-the-art SmartFlow™ technology, which enables precise control of the deposition rate and process uniformity. The SmartFlow module ensures a high level of uniformity across the entire wafer surface and enables the adjustment of the thickness of the deposit. The system is also designed with an integrated cooling unit, allowing for precise temperature optimization and stabilization of the substrate during processing. CONCEPT 2 Sequel Express features a dual programmable gas valve, providing a range of options for customizing the flow amount and composition. This allows for the formation of complex materials layers composed of multiple composite layers. The machine is also equipped with a low-pressure turbo pump, as well as a turbo molecular pump, allowing for the manipulation of processes by maintaining vacuum integrity. The tool is designed with an advanced multiplexing capability, which enables simultaneous processing of multiple substrates. This technology increases throughput and allows for batch operations of multiple wafers. NOVELLUS CONCEPT 2 Sequel Express is a reliable piece of equipment, providing highly efficient and consistent deposition processes for the semiconductor industry. Its advanced features provide users with the tools they need to create high-quality materials layers with a high level of process uniformity.