Used NOVELLUS CONCEPT 2 Sequel #171833 for sale

NOVELLUS CONCEPT 2 Sequel is a chemical vapor deposition (CVD) equipment designed for depositing a range of functional layers for semiconductor device fabrication. It is specifically designed for high-volume deposition of multiple stacks of dielectric, conductive and barrier materials in a single substrate exposure. The system is based on a low pressure, closed loop reactor chamber equipped with two independently adjustable gas sources, which deliver reactive flow to the substrate. A unique two-zone reactor design allows for sequential deposition of two or more material types or combinations; the unit automatically constantly adjusts parameters like pressure profile, temperature, gas flow, throughput, and dosage at the different deposition zones. CONCEPT 2 Sequel can process a wide variety of substrates including glass, silicon, organic and inorganic materials, as well as non-standard materials allowing for unprecedented flexibility when creating complex multi-layer structures integrated with enhanced performances. The machine incorporates a proprietary dielectric deposition module designed to facilitate high temperature "fast fire" deposition of advanced dielectric layers in a single sequence for accelerated throughput times. For superior dimensional control and improved performance features, advanced layer profiles are available with NOVELLUS CONCEPT 2 Sequel. The tool offers additional features such as variable frequency, variable power and variable pulse-width control for in-depth customization of deposition profiles. The Cycle-Time Optimization engine helps ensure asset automation and boost throughput with minimal process time by keeping track of deposition cycles and producing fast reaction parameters accordingly. CONCEPT 2 Sequel is a powerful and reliable equipment for producing a variety of microdevices, displays and other innovative semiconductor devices. This dependable model, with its wide range of versatile functions, is an ideal candidate for any production environment, where ultimate precision and process control are paramount.