Used NOVELLUS CONCEPT 2 Sequel #293627310 for sale

Manufacturer
NOVELLUS
Model
CONCEPT 2 Sequel
ID: 293627310
Vintage: 1996
System 1996 vintage.
NOVELLUS CONCEPT 2 Sequel is a single wafer, rotary electrode, plasma enhanced chemical vapor deposition (PECVD) reactor. It is designed to provide reliable, uniform films and coatings in high volume production. The reactor is an ideal choice for applications such as advanced interconnects, passivation and dielectrics. The reactor uses proprietary DC-enhancement technology to ensure process stability and uniformity while running ECR, ECD and sputtering processes in a wide range of temperature, pressure and RF frequencies. Its 5-axis modular module can achieve excellent uniformity and process window control. The reactor's innovative process chamber features remote RF cathode and RF window control systems. Internal electrodes control the deposition process in both nitrogen and argon environments. Its low thermal mass suspension arms help regulate uniformity across the wafer during deposition. In addition, the reactor also includes a process monitor and control system (PMCS) to monitor process parameters during operation. CONCEPT 2 Sequel can achieve deposition rates of up to 8um/min on 300mm wafers and features a low total ownership cost and high-temperature uniformity. It is designed to meet process requirements of advanced dielectrics, insulators, metallization and passivation. The reactor is capable of running SiO2 and amorphous carbon films as well as tantalum nitride and silicon nitride films. The reactor also provides a number of modular solutions such as three-zone uniform temperature and uniform RF distribution. This helps in providing excellent uniformity and improved productivity while reducing the total operating cost. In addition, the reactor can be configured to include a high-performance gas injector to facilitate precursor delivery as well as a safety interlock and/or back-end-of-line pyrometer for temperature sensing. Overall, NOVELLUS CONCEPT 2 Sequel is an advanced and reliable PECVD reactor that helps in the production of quality films and coatings in a cost-effective way. It guarantees uniformity and productivity while ensuring a safe and fast process.
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