Used NOVELLUS CONCEPT 2 Sequel #9066527 for sale
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ID: 9066527
Vintage: 2007
LCM System, 6"
Single Chamber
Plumbed for Nitride Deposition process
Chamber mounted in Right port location
QNX4 Control Type
MC3 System
Module Controllers
2007 vintage.
NOVELLUS CONCEPT 2 Sequel is a revolutionary semiconductor etch reactor designed to increase throughput in manufacturing processes and reduce costs. The reactor uses advanced deposition and etching processes to efficiently fabricate high-quality semiconductor components ranging from small memories to large microprocessors. CONCEPT 2 Sequel is a high-speed, high-density etch system capable of operating with minimal substrate damage. It employs a unique physical vapor deposition (PVD) process which creates an even coat of material on substrates before etching. PVD also produces a high-fidelity etch profile which produces a clear, replicable result. NOVELLUS CONCEPT 2 Sequel also supports a high degree of process flexibility which enables users to tailor the etch parameters to their specific needs. The system has a wide range of etch recipes that can be customized to accommodate various material, pressure, temperature, and geometry requirements. The system's advanced algorithms and expert control processes also help reduce production cycle times. Its efficient cycle start/stop sequencing minimizes downtime and its highly precise etch control processes reduce etch rates and reduce the chances of damage to produced components. CONCEPT 2 Sequel is a powerful tool that can be used in a variety of production processes and applications, such as device fabrication, planarization, chemical-mechanical polishing (CMP) and selective etch processes. Its superior etching performance and lower cost of ownership make it an ideal choice for industrial and consumer-scale etching jobs.
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