Used NOVELLUS CONCEPT 2 Sequel #9188213 for sale

Manufacturer
NOVELLUS
Model
CONCEPT 2 Sequel
ID: 9188213
Power rack.
NOVELLUS CONCEPT 2 Sequel is a high-performance etch reactor used in the manufacture of semiconductor chips. It is ideal for increased throughput, improved uniformity, and faster cycle times on dielectric, polysilicon, tungsten, and shallow trench isolation (STI) etch processes. The Concept 2 features a dual-pressure, dual-gas configuration which makes it extremely efficient. The higher quick-start pressure allows for relatively short start-up cycle times, while the lower working pressure ensures optimal gas and particle flow, resulting in lower processing costs. The Concept 2 also features two frequency-controlled RF generators that allow for finer control over the etch process. The dual-micromachined, double-LED scanning equipment ensures highest throughput with superior quality results, detecting even the smallest variations in particle size, uniformity, and sputter rates. The microwave generator allows the chamber to be heated instantly to the required temperature at start-up and during operation. Combined with the high-efficiency gas delivery system, this ensures the highest process throughput and optimal uniformity. The Concept 2 also features a cooled-plasma, cold-wall construction which provides a superior thermal-profiling solution around the area to be etched. This lowers thermal gradients, promoting better energy conservation, cuts cross-contamination, and eliminates reflections and cycle-time penalties due to mechanical tilt and scan. Furthermore, the Concept 2 enables quick access features that simplify maintenance and repairs. The platform features an integrated diagnostic center which allows operators to make changes and track adjustments made to the unit throughout the manufacturing process. In addition, the real-time process monitoring machine allows operators to monitor wafer etch quality and process parameters. Overall, CONCEPT 2 Sequel is an ideal reactor for increased yield, throughput, uniformity, and cost savings in the manufacture of semiconductor chips.
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