Used NOVELLUS CONCEPT 2 Sequel #9247399 for sale

NOVELLUS CONCEPT 2 Sequel is a versatile reactor capable of high deposition rate processes and multiple process applications. It was designed using advanced crucible technology and gas delivery systems to enable a wide range of materials to be processed. CONCEPT 2 Sequel reactor has a multi-chamber design, allowing the process time to be cut down by allowing more chambers to be processed at once. It can process up to 12 wafers simultaneously, allowing the throughput to be increased. Additionally, it has a variable process chamber size, allowing operators to accommodate different wafer sizes and substrate configurations into the reactor. This is useful for those interested in processing a range of substrates. This reactor also has a low-pressure CVD system, using gas mixing technology to create uniform gas flow between the wafers. This helps to ensure better film uniformity and repeatability of the deposited material. NOVELLUS CONCEPT 2 Sequel also features uniform temperature distribution across the wafer during deposition, using advanced thermal management techniques, such as heated pedestals and convection. This enables higher deposition rates with fewer thermal gradient issues. CONCEPT 2 Sequel reactor also includes a built-in process flow monitoring system, allowing operators to have a better understanding of the deposition process and making adjustments in real time, should something not be going as expected. This is important for ensuring cost efficiency and accurate process control. NOVELLUS CONCEPT 2 Sequel is a well-designed, reliable, and user-friendly reactor that can used to accommodate a variety of processes and materials. It offers high deposition rate processes and repeatable films, making it ideal for engineers looking for efficient processes and reliable results.