Used NOVELLUS CONCEPT 2 Sequel #9382778 for sale

NOVELLUS CONCEPT 2 Sequel is a third-generation deposition equipment, engineered to improve precision, productivity and performance for semiconductor device manufacturing. It is a highly advanced physical vapor deposition (PVD) reactor designed to keep up with the relentless pace of continuous improvement in the semiconductor industry. CONCEPT 2 Sequel's two-chamber design consists of an upper PVD chamber and a lower gas delivery chamber. The enclosed PVD chamber is a custom-built, plasma-based chamber optimized for performance, while the lower chamber is equipped with a gas delivery system that can create a dynamic flow of gases to the coating material. To maximize precision and accuracy, NOVELLUS CONCEPT 2 Sequel's proprietary cooling technology utilizes a high-pressure, turbulent-free recirculation unit to maintain constant temperatures and minimize gas convection while providing highly repeatable deposition conditions. CONCEPT 2 Sequel is loaded with sophisticated features to ensure consistent and high-quality film deposition. Its advanced ablative processes employ calibrated and controllable spot-size ablation to achieve pattern-following accuracy. Its flexible architecture and advanced metrology techniques enable the processor to tailor recipes to improve film stress and step coverage, and its programmed impedance tuning ensures consistent and repeatable results. NOVELLUS CONCEPT 2 Sequel incorporates a host of advanced process control capabilities designed to maximize process stability and scalability. Its multi-sided wafer handling machine provides precise rotation and acceleration control for accurate alignment and orientation of wafers. It also features a highly automated substrate handling tool, a precision stage mapping asset, a robotic arm for substrate identification and a smart in-situ model for fast and accurate diagnostics. Integrated into the equipment are real-time, immediate-action process control features, including a unique end-point detection capability. These features enable operators to respond quickly to process changes, thereby increasing throughput and yield to maximize economic benefit. CONCEPT 2 Sequel is an effective and reliable deposition system, designed to meet the demanding requirements of the 21st-century semiconductor device manufacturing industry. It is designed to maximize precision, productivity, and performance and enable increased costs, throughput and yields by optimizing process stability and scalability.