Used NOVELLUS CONCEPT 2 Sequel #9397737 for sale

NOVELLUS CONCEPT 2 Sequel is a high-performance, multi-station planar reactor system designed to provide an advanced process environment for deposition, stripping, etching and other semiconductor manufacturing processes. This reactor includes an integrated planar plasma reactive-ion etch (RIE) station, and is an ideal platform for the fabrication of advanced device structures. CONCEPT 2 Sequel at its core is a large metal box that contains a number of different components necessary to deliver process functionalities. It includes two main processing chambers; an RF plasma chamber and a Magnetron-based deposition chamber. It also includes a multi-station planar RIE station. This station can be used for the etching of a variety of materials on the wafer surface, such as metals, metals foils, oxides, and even plastics materials. NOVELLUS CONCEPT 2 Sequel features four different processing chambers; an etch chamber for RIE etching, a deposition chamber for chemical vapor deposition (CVD), a stripping chamber for chemical stripping of organic materials, and a chemical-mechanical polishing (CMP) chamber. In the RIE chamber, a radio frequency (RF) power source drives the plasma generation to directly etch wafers with very precise process control. The Magnetron-based deposition chamber incorporates two cathodes, one of which is used to generate a gas plasma, while the other is used to magnetically bind particles within the plasma. This type of deposition allows for a variety of different chemical processes, such as plasma enhanced chemical vapor deposition (PECVD) and atomic layer deposition (ALD). CONCEPT 2 Sequel also features a highly-configurable strip chamber that delivers an effective means of removing organic materials from wafers. The CMP chamber utilizes a high-velocity liquid slurry combined with a polishing pad to mechanically polish wafers in order to remove any unwanted material and obtain a smooth, uniform surface quality. Overall, NOVELLUS CONCEPT 2 Sequel is an advanced, high-performance reactor system enabling the manufacture of advanced device structures. With its integrated planar plasma RIE station, CONCEPT 2 Sequel is capable of performing a variety of different deposition, stripping, etching and CMP processes in a very efficient manner. This reactor system is certainly a major improvement over the traditional chamber-based sequential processes, thus making it an ideal platform for the fabrication of semiconductor materials.