Used NOVELLUS CONCEPT 2 Sequel #9399068 for sale

NOVELLUS CONCEPT 2 Sequel is a high-temperature Chemical Vapor Deposition (CVD) equipment designed for wafer processing. Engineered to meet with the most demanding semiconductor manufacturing needs, CONCEPT 2 Sequel reactor provides superior, precise control in film deposition during a wide range of substrate temperatures. The system utilizes a heater pedestal foundation, allowing for reliable and accurate control of substrate temperature up to 1000 degrees Celsius. It can also be configured for process pressures up to 1 Torr. Boasting an innovative multi-piston design, NOVELLUS CONCEPT 2 Sequel allows for the simultaneous use of metal or metal-organic source materials. The process gases used in CONCEPT 2 Sequel can either be automatically distributed or controlled manually, enabling improved film uniformity and thickness. Its enclosed open-chamber design allows for easy installation in existing production lines and an optimal temperature balance within the substrate. It also allows for the capture of effluents that would otherwise pollute the atmosphere. In addition to its superior temperature and pressure control, NOVELLUS CONCEPT 2 Sequel also features an efficient gas flow control unit. This machine monitors the gas flow inside the reactor and can quickly adjust the level of pressure and temperature within substrate. Moreover, the reactor is compatible with programs in the Semiconductor Manufacturing Execution Tool (SMES) software, allowing the user to easily track the asset's performance. Built using the latest in NOVELLUS technology, CONCEPT 2 Sequel reactor is highly reliable and energy efficient. It also features a variety of safety features that protect the model from hazardous materials, heat, or pressure disruptions. Finally, NOVELLUS CONCEPT 2 Sequel is particularly easy to maintain, requiring only minimal downtime when servicing is needed.