Used NOVELLUS CONCEPT 2 Speed-S #9206613 for sale

Manufacturer
NOVELLUS
Model
CONCEPT 2 Speed-S
ID: 9206613
Wafer Size: 8"
Vintage: 2001
CVD-HDP System, 8" Single chamber Missing parts 2001 vintage.
NOVELLUS CONCEPT 2 Speed-S Reactor is a chemical vapor deposition (CVD) tool used to apply very thin layers of material onto the surface of a workpiece. This CVD tool can deposit a variety of different materials, like aluminum, silicon, germanium, and other metalloids, that function to modify and enhance the surface characteristics of the substrate. The Speed-S Reactor offers unparalleled control over the nanometer-level thickness and chemical composition of the deposited layers. This reactor maintains an ultra-high vacuum environment in the reaction chamber for the highest quality film deposition and ensures that the process operates with minimal impurities. The Speed-S Reactor is designed to be extremely efficient, providing uniform film distribution over the entire substrate surface while eliminating any deposition defects. This is accomplished by a combination of advanced technologies, such as its patented GasFlow-3 equipment, which precisely controls the flow of process gases, and the Brush-Lift system which continuously cleans the workpiece surface throughout the deposition process. The Speed-S Reactor is also able to provide repeatable layers of organic materials, like polymers, through its spin-on-glass feature, allowing tailored films to be easily produced. The unit's flammable residual gas management machine (FRGMS) ensures safety and compliance with governmental regulations, while the Reactor's 'ActivePlay' technologies allow for remote monitoring and control of the Speed-S Reactor from a contactless, remote location. The Speed-S Reactor is able to reliably produce repeatable, uniform, and very thin films with uniform thickness over the entire substrate area, allowing for enhanced surface characteristics and improved corrosion resistance. The deposition process utilizes a high temperature, high precision oven, and can deposit materials at a wide range of film thicknesses, from thousands of angstroms to hundreds of microns. The Speed-S Reactor is designed to be easily integrated into existing production lines, and is compatible with a wide variety of automated processes. The tool also features a 'SmartLink' which allows for on-the-fly process optimization, using AI-driven algorithms to adjust the process parameters in real-time. This makes the Speed-S Reactor ideal for industries such as automotive, aerospace, and electronics where precision is essential. The Speed-S Reactor offers long-term reliability, low cost maintenance, and easy operation, making it the preferred choice for applications such as dielectric films, atomic layer deposition, and photovoltaic layers.
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