Used NOVELLUS CONCEPT 2 Speed Shrink #9294359 for sale

A NOVELLUS CONCEPT 2 Speed Shrink is a type of high-speed, high-performance physical vapor deposition (PVD) reactor used in semiconductor and related manufacturing industries. It is capable of depositing multiple films that are used for interconnection, device fabrication, and device protection. The Concept 2 reactor is an optically and mechanically advanced, "floating" chamber design, utilizing ultra-stiff dynamic chamber components to reduce vibration and maximize throughput. The Concept 2 uses an advanced PVD film deposition equipment, allowing the deposition of aluminum, tungsten, and copper films in one tool. The operator is able to set the deposition rate, target thickness, and layer composition, allowing for repeatable and reliable films. In addition, the Concept 2 can produce a wide range of films, such as oxides, nitrides, and metal silicides. For improved film uniformity, the Concept 2 uses an advanced coil-coupled magnetron system. This unit utilizes two magnetrons, one to create the sputtering plasma and the other to neutralize the electrons in the chamber, resulting in uniform films with low particle generation. Additionally, the Concept 2 utilizes advanced internal process controls to allow for recipe tuning and process optimization. The Concept 2 design features an infrared laser lapping machine for superior substrate alignment. This tool can accurately adjust the wafer's surface towithin 10μm of the design plane. The asset also has advanced wafer catering capabilities, allowing for up to 10 different films to be stacked in one process run. The process parameters can be adjusted depending on the particular films being deposited, resulting in repeatable thicknesses and composition. In terms of safety features, NOVELLUS Concept 2 features a sprayback feature which shuts off the chamber gas when the control model notices a dangerous pressure buildup. In addition, the equipment has an aggressive scrubber system to ensure safe emission levels of potentially harmful particles. Moreover, the process gases can be isolated and monitored in separate branches for easy maintenance. Overall, CONCEPT 2 Speed Shrink reactor is an advanced PVD tool, capable of depositing multiple films with excellent uniformity and repeatability. It is a key tool in semiconductor and related manufacturing industries for its ability to produce high performance films with superior safety features.